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Article: Annealing-induced abnormal hardening in nanocrystalline NbMoTaW high-entropy alloy thin films

TitleAnnealing-induced abnormal hardening in nanocrystalline NbMoTaW high-entropy alloy thin films
Authors
Feng, XiaobinUtama Surjadi, JamesLu, Yang
KeywordsGrain boundary
High-entropy alloy (HEA)
Mechanical properties
Nanocrystalline
Thermal properties
Thin film
Issue Date2020
Citation
Materials Letters, 2020, v. 275, article no. 128097 How to Cite?
DOI: http://dx.doi.org/10.1016/j.matlet.2020.128097
AbstractHigh temperature annealing of high-entropy alloys (HEA) typically results in reduced hardness due to grain coarsening, limiting its potential for applications at elevated temperatures. However, in this work, our nanocrystalline NbMoTaW HEA thin film exhibits enhanced hardness up to ~ 17.1 GPa after isothermal annealing at 800 °C for ~ 6 h (hrs). This phenomenon can be explained mainly by the formation of amorphous intergranular films (AIFs). This work does not only demonstrate a high-performance HEA film for potential high-temperature applications, but also provides a practical approach to tailor mechanical properties of nanostructured HEAs.
Persistent Identifierhttp://hdl.handle.net/10722/326220
ISSN
0167-577X
2021 Impact Factor: 3.574
2020 SCImago Journal Rankings: 0.755
ISI Accession Number ID
WOS:000548646700013

 

DC FieldValueLanguage
dc.contributor.authorFeng, Xiaobin-
dc.contributor.authorUtama Surjadi, James-
dc.contributor.authorLu, Yang-
dc.date.accessioned2023-03-09T09:58:59Z-
dc.date.available2023-03-09T09:58:59Z-
dc.date.issued2020-
dc.identifier.citationMaterials Letters, 2020, v. 275, article no. 128097-
dc.identifier.issn0167-577X-
dc.identifier.urihttp://hdl.handle.net/10722/326220-
dc.description.abstractHigh temperature annealing of high-entropy alloys (HEA) typically results in reduced hardness due to grain coarsening, limiting its potential for applications at elevated temperatures. However, in this work, our nanocrystalline NbMoTaW HEA thin film exhibits enhanced hardness up to ~ 17.1 GPa after isothermal annealing at 800 °C for ~ 6 h (hrs). This phenomenon can be explained mainly by the formation of amorphous intergranular films (AIFs). This work does not only demonstrate a high-performance HEA film for potential high-temperature applications, but also provides a practical approach to tailor mechanical properties of nanostructured HEAs.-
dc.languageeng-
dc.relation.ispartofMaterials Letters-
dc.subjectGrain boundary-
dc.subjectHigh-entropy alloy (HEA)-
dc.subjectMechanical properties-
dc.subjectNanocrystalline-
dc.subjectThermal properties-
dc.subjectThin film-
dc.titleAnnealing-induced abnormal hardening in nanocrystalline NbMoTaW high-entropy alloy thin films-
dc.typeArticle-
dc.description.naturelink_to_subscribed_fulltext-
dc.identifier.doi10.1016/j.matlet.2020.128097-
dc.identifier.scopuseid_2-s2.0-85086140261-
dc.identifier.volume275-
dc.identifier.spagearticle no. 128097-
dc.identifier.epagearticle no. 128097-
dc.identifier.eissn1873-4979-
dc.identifier.isiWOS:000548646700013-

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