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Article:  The Adatom Concentration Profile: A Paradigm for Understanding Two-Dimensional MoS 2 Morphological Evolution in Chemical Vapor Deposition Growth

Title The Adatom Concentration Profile: A Paradigm for Understanding Two-Dimensional MoS 2 Morphological Evolution in Chemical Vapor Deposition Growth
Authors
Xu, JSrolovitz, DJHo, D
Issue Date2021
Citation
ACS Nano, 2021, v. 15, p. 6839-6848 How to Cite?
DOI: http://dx.doi.org/10.1021/acsnano.0c10474
Persistent Identifierhttp://hdl.handle.net/10722/322770
ISI Accession Number ID
WOS:000645436800077

 

DC FieldValueLanguage
dc.contributor.authorXu, J-
dc.contributor.authorSrolovitz, DJ-
dc.contributor.authorHo, D-
dc.date.accessioned2022-11-14T08:32:39Z-
dc.date.available2022-11-14T08:32:39Z-
dc.date.issued2021-
dc.identifier.citationACS Nano, 2021, v. 15, p. 6839-6848-
dc.identifier.urihttp://hdl.handle.net/10722/322770-
dc.languageeng-
dc.relation.ispartofACS Nano-
dc.title The Adatom Concentration Profile: A Paradigm for Understanding Two-Dimensional MoS 2 Morphological Evolution in Chemical Vapor Deposition Growth -
dc.typeArticle-
dc.identifier.emailSrolovitz, DJ: srol@hku.hk-
dc.identifier.authoritySrolovitz, DJ=rp02868-
dc.identifier.doi10.1021/acsnano.0c10474-
dc.identifier.hkuros341711-
dc.identifier.volume15-
dc.identifier.spage6839-
dc.identifier.epage6848-
dc.identifier.isiWOS:000645436800077-

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