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Article: Spatial modulation of nanopattern dimensions by combining interference lithography and grayscale-patterned secondary exposure

TitleSpatial modulation of nanopattern dimensions by combining interference lithography and grayscale-patterned secondary exposure
Authors
Gan, ZhuofeiGan, ZhuofeiChen, LiyangMin, SiyiLiang, ChuweiXu, MenghongJiang, ZijieSun, ZhaoSun, ChuyingCui, DehuLi, Wendi
Issue Date2022
Citation
Light: Science & Applications, 2022, v. 11 n. 1, p. 1-10 How to Cite?
DOI: http://dx.doi.org/10.1038/s41377-022-00774-z
Persistent Identifierhttp://hdl.handle.net/10722/322268
ISSN
2095-5545
2023 Impact Factor: 20.6

 

DC FieldValueLanguage
dc.contributor.authorGan, Zhuofei-
dc.contributor.authorGan, Zhuofei-
dc.contributor.authorChen, Liyang-
dc.contributor.authorMin, Siyi-
dc.contributor.authorLiang, Chuwei-
dc.contributor.authorXu, Menghong-
dc.contributor.authorJiang, Zijie-
dc.contributor.authorSun, Zhao-
dc.contributor.authorSun, Chuying-
dc.contributor.authorCui, Dehu-
dc.contributor.authorLi, Wendi-
dc.date.accessioned2022-11-14T08:18:31Z-
dc.date.available2022-11-14T08:18:31Z-
dc.date.issued2022-
dc.identifier.citationLight: Science & Applications, 2022, v. 11 n. 1, p. 1-10-
dc.identifier.issn2095-5545-
dc.identifier.urihttp://hdl.handle.net/10722/322268-
dc.languageeng-
dc.relation.ispartofLight: Science & Applications-
dc.titleSpatial modulation of nanopattern dimensions by combining interference lithography and grayscale-patterned secondary exposure-
dc.typeArticle-
dc.identifier.doi10.1038/s41377-022-00774-z-
dc.identifier.hkuros341842-
dc.identifier.volume11-
dc.identifier.issue1-
dc.identifier.spage1-
dc.identifier.epage10-

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