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Conference Paper: Non-lithographic patterning and metal-assisted chemical etching for manufacturing of tunable light-emitting silicon nanowire arrays

TitleNon-lithographic patterning and metal-assisted chemical etching for manufacturing of tunable light-emitting silicon nanowire arrays
Authors
Issue Date2010
Citation
Optics InfoBase Conference Papers, 2010 How to Cite?
AbstractWe report a top-down fabrication method that involves the combination of superionic-solid-state-stamping (S4) patterning with metal-assisted-chemical-etching (MacEtch), to produce silicon nanowire arrays with defined geometry and optical properties in a manufacturable fashion. © 2010 Optical Society of America.
Persistent Identifierhttp://hdl.handle.net/10722/318837

 

DC FieldValueLanguage
dc.contributor.authorChern, W.-
dc.contributor.authorHsu, K.-
dc.contributor.authorChun, I.-
dc.contributor.authorAzeredo, B.-
dc.contributor.authorFang, N.-
dc.contributor.authorFerreira, P.-
dc.contributor.authorLi, X.-
dc.date.accessioned2022-10-11T12:24:40Z-
dc.date.available2022-10-11T12:24:40Z-
dc.date.issued2010-
dc.identifier.citationOptics InfoBase Conference Papers, 2010-
dc.identifier.urihttp://hdl.handle.net/10722/318837-
dc.description.abstractWe report a top-down fabrication method that involves the combination of superionic-solid-state-stamping (S4) patterning with metal-assisted-chemical-etching (MacEtch), to produce silicon nanowire arrays with defined geometry and optical properties in a manufacturable fashion. © 2010 Optical Society of America.-
dc.languageeng-
dc.relation.ispartofOptics InfoBase Conference Papers-
dc.titleNon-lithographic patterning and metal-assisted chemical etching for manufacturing of tunable light-emitting silicon nanowire arrays-
dc.typeConference_Paper-
dc.description.naturelink_to_subscribed_fulltext-
dc.identifier.doi10.1364/cleo.2010.cthv6-
dc.identifier.scopuseid_2-s2.0-85086614083-
dc.identifier.eissn2162-2701-

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