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Article: Thermal conductivity of silicon nanowire arrays with controlled roughness

TitleThermal conductivity of silicon nanowire arrays with controlled roughness
Authors
Issue Date2012
Citation
Journal of Applied Physics, 2012, v. 112, n. 11, article no. 114306 How to Cite?
AbstractA two-step metal assisted chemical etching technique is used to systematically vary the sidewall roughness of Si nanowires in vertically aligned arrays. The thermal conductivities of nanowire arrays are studied using time domain thermoreflectance and compared to their high-resolution transmission electron microscopy determined roughness. The thermal conductivity of nanowires with small roughness is close to a theoretical prediction based on an upper limit of the mean-free-paths of phonons given by the nanowire diameter. The thermal conductivity of nanowires with large roughness is found to be significantly below this prediction. Raman spectroscopy reveals that nanowires with large roughness also display significant broadening of the one-phonon peak; the broadening correlates well with the reduction in thermal conductivity. The origin of this broadening is not yet understood, as it is inconsistent with phonon confinement models, but could derive from microstructural changes that affect both the optical phonons observed in Raman scattering and the acoustic phonons that are important for heat conduction. © 2012 American Institute of Physics.
Persistent Identifierhttp://hdl.handle.net/10722/318521
ISSN
2023 Impact Factor: 2.7
2023 SCImago Journal Rankings: 0.649
ISI Accession Number ID

 

DC FieldValueLanguage
dc.contributor.authorFeser, Joseph P.-
dc.contributor.authorSadhu, Jyothi S.-
dc.contributor.authorAzeredo, Bruno P.-
dc.contributor.authorHsu, Keng H.-
dc.contributor.authorMa, Jun-
dc.contributor.authorKim, Junhwan-
dc.contributor.authorSeong, Myunghoon-
dc.contributor.authorFang, Nicholas X.-
dc.contributor.authorLi, Xiuling-
dc.contributor.authorFerreira, Placid M.-
dc.contributor.authorSinha, Sanjiv-
dc.contributor.authorCahill, David G.-
dc.date.accessioned2022-10-11T12:23:57Z-
dc.date.available2022-10-11T12:23:57Z-
dc.date.issued2012-
dc.identifier.citationJournal of Applied Physics, 2012, v. 112, n. 11, article no. 114306-
dc.identifier.issn0021-8979-
dc.identifier.urihttp://hdl.handle.net/10722/318521-
dc.description.abstractA two-step metal assisted chemical etching technique is used to systematically vary the sidewall roughness of Si nanowires in vertically aligned arrays. The thermal conductivities of nanowire arrays are studied using time domain thermoreflectance and compared to their high-resolution transmission electron microscopy determined roughness. The thermal conductivity of nanowires with small roughness is close to a theoretical prediction based on an upper limit of the mean-free-paths of phonons given by the nanowire diameter. The thermal conductivity of nanowires with large roughness is found to be significantly below this prediction. Raman spectroscopy reveals that nanowires with large roughness also display significant broadening of the one-phonon peak; the broadening correlates well with the reduction in thermal conductivity. The origin of this broadening is not yet understood, as it is inconsistent with phonon confinement models, but could derive from microstructural changes that affect both the optical phonons observed in Raman scattering and the acoustic phonons that are important for heat conduction. © 2012 American Institute of Physics.-
dc.languageeng-
dc.relation.ispartofJournal of Applied Physics-
dc.titleThermal conductivity of silicon nanowire arrays with controlled roughness-
dc.typeArticle-
dc.description.naturelink_to_subscribed_fulltext-
dc.identifier.doi10.1063/1.4767456-
dc.identifier.scopuseid_2-s2.0-84871189399-
dc.identifier.volume112-
dc.identifier.issue11-
dc.identifier.spagearticle no. 114306-
dc.identifier.epagearticle no. 114306-
dc.identifier.isiWOS:000312490700111-

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