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Article: Direct metal nano-imprinting using an embossed solid electrolyte stamp

TitleDirect metal nano-imprinting using an embossed solid electrolyte stamp
Authors
Issue Date2011
Citation
Nanotechnology, 2011, v. 22, n. 15, article no. 155302 How to Cite?
AbstractIn this paper, we report direct patterning of metal nanostructures using an embossed solid electrochemical stamp. Microforming of solid superionic stamps using Si templates - analogous to polymer patterning in nano-imprint lithography - is explored. Silver sulfide (Ag2S) - a superionic conductor with excellent microforming properties - is investigated as a candidate material. Important parameters of the superionic stamp, including mechanical behavior, material flow during forming and feature recovery after embossing, are studied. Excellent feature transferability during embossing as well as etching is observed. To illustrate the capability of this approach silver nano-antennas with gaps < 10nm were successfully fabricated. The possibility for large area patterning with stamp diameters > 6mm is also demonstrated. Embossing-based metal patterning allows fabrication beyond two-dimensional nanofabrication and several patterning schemes are reported. © 2011 IOP Publishing Ltd.
Persistent Identifierhttp://hdl.handle.net/10722/318491
ISSN
2021 Impact Factor: 3.953
2020 SCImago Journal Rankings: 0.926
ISI Accession Number ID

 

DC FieldValueLanguage
dc.contributor.authorKumar, A.-
dc.contributor.authorHsu, K. H.-
dc.contributor.authorJacobs, K. E.-
dc.contributor.authorFerreira, P. M.-
dc.contributor.authorFang, N. X.-
dc.date.accessioned2022-10-11T12:23:53Z-
dc.date.available2022-10-11T12:23:53Z-
dc.date.issued2011-
dc.identifier.citationNanotechnology, 2011, v. 22, n. 15, article no. 155302-
dc.identifier.issn0957-4484-
dc.identifier.urihttp://hdl.handle.net/10722/318491-
dc.description.abstractIn this paper, we report direct patterning of metal nanostructures using an embossed solid electrochemical stamp. Microforming of solid superionic stamps using Si templates - analogous to polymer patterning in nano-imprint lithography - is explored. Silver sulfide (Ag2S) - a superionic conductor with excellent microforming properties - is investigated as a candidate material. Important parameters of the superionic stamp, including mechanical behavior, material flow during forming and feature recovery after embossing, are studied. Excellent feature transferability during embossing as well as etching is observed. To illustrate the capability of this approach silver nano-antennas with gaps < 10nm were successfully fabricated. The possibility for large area patterning with stamp diameters > 6mm is also demonstrated. Embossing-based metal patterning allows fabrication beyond two-dimensional nanofabrication and several patterning schemes are reported. © 2011 IOP Publishing Ltd.-
dc.languageeng-
dc.relation.ispartofNanotechnology-
dc.titleDirect metal nano-imprinting using an embossed solid electrolyte stamp-
dc.typeArticle-
dc.description.naturelink_to_subscribed_fulltext-
dc.identifier.doi10.1088/0957-4484/22/15/155302-
dc.identifier.scopuseid_2-s2.0-79952662629-
dc.identifier.volume22-
dc.identifier.issue15-
dc.identifier.spagearticle no. 155302-
dc.identifier.epagearticle no. 155302-
dc.identifier.eissn1361-6528-
dc.identifier.isiWOS:000288209700005-

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