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Conference Paper: Non-lithographic patterning and metal-assisted chemical etching for manufacturing of tunable light-emitting silicon nanowire arrays

TitleNon-lithographic patterning and metal-assisted chemical etching for manufacturing of tunable light-emitting silicon nanowire arrays
Authors
Chern, W.Hsu, K.Chun, I.Azeredo, B.Fang, N.Ferreira, P.Li, X.
Issue Date2010
Citation
Lasers and Electro-Optics/Quantum Electronics and Laser Science Conference: 2010 Laser Science to Photonic Applications, CLEO/QELS 2010, 2010, article no. 5500293 How to Cite?
AbstractWe report a top-down fabrication method that involves the combination of superionic-solid-statestamping (S4) patterning with metal-assisted-chemical- etching (MacEtch), to produce silicon nanowire arrays with defined geometry and optical properties in a manufacturable fashion. © 2010 Optical Society ot America.
Persistent Identifierhttp://hdl.handle.net/10722/318481
ISI Accession Number ID
WOS:000290513601141

 

DC FieldValueLanguage
dc.contributor.authorChern, W.-
dc.contributor.authorHsu, K.-
dc.contributor.authorChun, I.-
dc.contributor.authorAzeredo, B.-
dc.contributor.authorFang, N.-
dc.contributor.authorFerreira, P.-
dc.contributor.authorLi, X.-
dc.date.accessioned2022-10-11T12:23:51Z-
dc.date.available2022-10-11T12:23:51Z-
dc.date.issued2010-
dc.identifier.citationLasers and Electro-Optics/Quantum Electronics and Laser Science Conference: 2010 Laser Science to Photonic Applications, CLEO/QELS 2010, 2010, article no. 5500293-
dc.identifier.urihttp://hdl.handle.net/10722/318481-
dc.description.abstractWe report a top-down fabrication method that involves the combination of superionic-solid-statestamping (S4) patterning with metal-assisted-chemical- etching (MacEtch), to produce silicon nanowire arrays with defined geometry and optical properties in a manufacturable fashion. © 2010 Optical Society ot America.-
dc.languageeng-
dc.relation.ispartofLasers and Electro-Optics/Quantum Electronics and Laser Science Conference: 2010 Laser Science to Photonic Applications, CLEO/QELS 2010-
dc.titleNon-lithographic patterning and metal-assisted chemical etching for manufacturing of tunable light-emitting silicon nanowire arrays-
dc.typeConference_Paper-
dc.description.naturelink_to_subscribed_fulltext-
dc.identifier.scopuseid_2-s2.0-77957596017-
dc.identifier.spagearticle no. 5500293-
dc.identifier.epagearticle no. 5500293-
dc.identifier.isiWOS:000290513601141-

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