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postgraduate thesis: Aberration sensitivity reduction of alternating phase-shifting mask inphotolithography
| Title | Aberration sensitivity reduction of alternating phase-shifting mask inphotolithography |
|---|---|
| Authors | |
| Advisors | Advisor(s):Lam, EYM |
| Issue Date | 2004 |
| Publisher | The University of Hong Kong (Pokfulam, Hong Kong) |
| Citation | Mak, Y. G. [麥易康]. (2004). Aberration sensitivity reduction of alternating phase-shifting mask in photolithography. (Thesis). University of Hong Kong, Pokfulam, Hong Kong SAR. Retrieved from http://dx.doi.org/10.5353/th_b3072124 |
| Degree | Master of Philosophy |
| Subject | Aberration. Integrated circuits - Masks Photolithography. |
| Dept/Program | Electrical and Electronic Engineering |
| Persistent Identifier | http://hdl.handle.net/10722/31822 |
| HKU Library Item ID | b3072124 |
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.advisor | Lam, EYM | - |
| dc.contributor.author | Mak, Yick-hong, Giuseppe. | - |
| dc.contributor.author | 麥易康. | - |
| dc.date.issued | 2004 | - |
| dc.identifier.citation | Mak, Y. G. [麥易康]. (2004). Aberration sensitivity reduction of alternating phase-shifting mask in photolithography. (Thesis). University of Hong Kong, Pokfulam, Hong Kong SAR. Retrieved from http://dx.doi.org/10.5353/th_b3072124 | - |
| dc.identifier.uri | http://hdl.handle.net/10722/31822 | - |
| dc.language | eng | - |
| dc.publisher | The University of Hong Kong (Pokfulam, Hong Kong) | - |
| dc.relation.ispartof | HKU Theses Online (HKUTO) | - |
| dc.rights | The author retains all proprietary rights, (such as patent rights) and the right to use in future works. | - |
| dc.rights | This work is licensed under a Creative Commons Attribution-NonCommercial-NoDerivatives 4.0 International License. | - |
| dc.source.uri | http://hub.hku.hk/bib/B30721246 | - |
| dc.subject.lcsh | Aberration. | - |
| dc.subject.lcsh | Integrated circuits - Masks | - |
| dc.subject.lcsh | Photolithography. | - |
| dc.title | Aberration sensitivity reduction of alternating phase-shifting mask inphotolithography | - |
| dc.type | PG_Thesis | - |
| dc.identifier.hkul | b3072124 | - |
| dc.description.thesisname | Master of Philosophy | - |
| dc.description.thesislevel | Master | - |
| dc.description.thesisdiscipline | Electrical and Electronic Engineering | - |
| dc.description.nature | published_or_final_version | - |
| dc.description.nature | abstract | - |
| dc.description.nature | toc | - |
| dc.identifier.doi | 10.5353/th_b3072124 | - |
| dc.date.hkucongregation | 2005 | - |
| dc.identifier.mmsid | 991010213749703414 | - |