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Article: High-density Au nanorod optical field-emitter arrays

TitleHigh-density Au nanorod optical field-emitter arrays
Authors
Keywordselectron beam lithography
field-emitter array
nanofabrication
photocathode
ultrafast
Issue Date2014
Citation
Nanotechnology, 2014, v. 25, n. 46, article no. 465304 How to Cite?
AbstractWe demonstrate the design, fabrication, characterization, and operation of high-density arrays of Au nanorod electron emitters, fabricated by high-resolution electron beam lithography, and excited by ultrafast femtosecond near-infrared radiation. Electron emission characteristic of multiphoton absorption has been observed at low laser fluence, as indicated by the power-law scaling of emission current with applied optical power. The onset of space-charge-limited current and strong optical field emission has been investigated so as to determine the mechanism of electron emission at high incident laser fluence. Laser-induced structural damage has been observed at applied optical fields above 5 GV m-1, and energy spectra of emitted electrons have been measured using an electron time-of-flight spectrometer.
Persistent Identifierhttp://hdl.handle.net/10722/317024
ISSN
2023 Impact Factor: 2.9
2023 SCImago Journal Rankings: 0.631
ISI Accession Number ID

 

DC FieldValueLanguage
dc.contributor.authorHobbs, R. G.-
dc.contributor.authorYang, Y.-
dc.contributor.authorKeathley, P. D.-
dc.contributor.authorSwanwick, M. E.-
dc.contributor.authorVelásquez-Garcíia, L. F.-
dc.contributor.authorKärtner, F. X.-
dc.contributor.authorGraves, W. S.-
dc.contributor.authorBerggren, K. K.-
dc.date.accessioned2022-09-19T06:18:38Z-
dc.date.available2022-09-19T06:18:38Z-
dc.date.issued2014-
dc.identifier.citationNanotechnology, 2014, v. 25, n. 46, article no. 465304-
dc.identifier.issn0957-4484-
dc.identifier.urihttp://hdl.handle.net/10722/317024-
dc.description.abstractWe demonstrate the design, fabrication, characterization, and operation of high-density arrays of Au nanorod electron emitters, fabricated by high-resolution electron beam lithography, and excited by ultrafast femtosecond near-infrared radiation. Electron emission characteristic of multiphoton absorption has been observed at low laser fluence, as indicated by the power-law scaling of emission current with applied optical power. The onset of space-charge-limited current and strong optical field emission has been investigated so as to determine the mechanism of electron emission at high incident laser fluence. Laser-induced structural damage has been observed at applied optical fields above 5 GV m-1, and energy spectra of emitted electrons have been measured using an electron time-of-flight spectrometer.-
dc.languageeng-
dc.relation.ispartofNanotechnology-
dc.subjectelectron beam lithography-
dc.subjectfield-emitter array-
dc.subjectnanofabrication-
dc.subjectphotocathode-
dc.subjectultrafast-
dc.titleHigh-density Au nanorod optical field-emitter arrays-
dc.typeArticle-
dc.description.naturelink_to_subscribed_fulltext-
dc.identifier.doi10.1088/0957-4484/25/46/465304-
dc.identifier.scopuseid_2-s2.0-84909594547-
dc.identifier.volume25-
dc.identifier.issue46-
dc.identifier.spagearticle no. 465304-
dc.identifier.epagearticle no. 465304-
dc.identifier.eissn1361-6528-
dc.identifier.isiWOS:000344375500008-

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