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Article: The concept of super enamel formation —Relationship between chemical interaction and enamel acid-base resistant zone at the self-etch adhesive/enamel interface

TitleThe concept of super enamel formation —Relationship between chemical interaction and enamel acid-base resistant zone at the self-etch adhesive/enamel interface
Authors
KeywordsAcid-base resistant zone
MDP
Self-etch adhesive
Super enamel
Issue Date2020
PublisherNihon Shika Riko Gakkai. The Journal's web site is located at http://www.jsdmd.jp/allpdf.html
Citation
Dental Materials Journal, 2020, v. 39 n. 4, p. 534-538 How to Cite?
AbstractSelf-etch adhesive (SEA) systems simplify bonding procedures. It is believed that good mechanical retention and chemical bonding are both important factors to obtain reliable bonding to enamel. The enamel acid-base resistant zone (ABRZ) has been confirmed at the adhesive/enamel interface by scanning electron microscopic observation. However, the formation of enamel ABRZ is influenced by the type and components of adhesive systems. Chemical interactions by a functional monomer with hydroxyapatite strongly support the explanation of the mechanism for enamel ABRZ formation. The ABRZ created by MDP-containing SEA systems has shown good potential to resist acid attack from simulated recurrent caries models. In addition, fluoride release may enhance acid resistance. It has been proposed that such a reinforced enamel be termed “Super Enamel”. The concept of the formation of super enamel may contribute to protecting enamel, and conserve tooth structure leading to improved restoration longevity.
DescriptionBronze open access
Persistent Identifierhttp://hdl.handle.net/10722/306476
ISSN
2023 Impact Factor: 1.9
2023 SCImago Journal Rankings: 0.589
ISI Accession Number ID

 

DC FieldValueLanguage
dc.contributor.authorNikaido, T-
dc.contributor.authorTakagaki, T-
dc.contributor.authorSato, T-
dc.contributor.authorBurrow, MF-
dc.contributor.authorTagami, J-
dc.date.accessioned2021-10-22T07:35:10Z-
dc.date.available2021-10-22T07:35:10Z-
dc.date.issued2020-
dc.identifier.citationDental Materials Journal, 2020, v. 39 n. 4, p. 534-538-
dc.identifier.issn0287-4547-
dc.identifier.urihttp://hdl.handle.net/10722/306476-
dc.descriptionBronze open access-
dc.description.abstractSelf-etch adhesive (SEA) systems simplify bonding procedures. It is believed that good mechanical retention and chemical bonding are both important factors to obtain reliable bonding to enamel. The enamel acid-base resistant zone (ABRZ) has been confirmed at the adhesive/enamel interface by scanning electron microscopic observation. However, the formation of enamel ABRZ is influenced by the type and components of adhesive systems. Chemical interactions by a functional monomer with hydroxyapatite strongly support the explanation of the mechanism for enamel ABRZ formation. The ABRZ created by MDP-containing SEA systems has shown good potential to resist acid attack from simulated recurrent caries models. In addition, fluoride release may enhance acid resistance. It has been proposed that such a reinforced enamel be termed “Super Enamel”. The concept of the formation of super enamel may contribute to protecting enamel, and conserve tooth structure leading to improved restoration longevity.-
dc.languageeng-
dc.publisherNihon Shika Riko Gakkai. The Journal's web site is located at http://www.jsdmd.jp/allpdf.html-
dc.relation.ispartofDental Materials Journal-
dc.subjectAcid-base resistant zone-
dc.subjectMDP-
dc.subjectSelf-etch adhesive-
dc.subjectSuper enamel-
dc.titleThe concept of super enamel formation —Relationship between chemical interaction and enamel acid-base resistant zone at the self-etch adhesive/enamel interface-
dc.typeArticle-
dc.identifier.emailBurrow, MF: mfburr58@hku.hk-
dc.identifier.authorityBurrow, MF=rp01306-
dc.description.naturelink_to_OA_fulltext-
dc.identifier.doi10.4012/dmj.2020-165-
dc.identifier.pmid32624553-
dc.identifier.scopuseid_2-s2.0-85088914391-
dc.identifier.hkuros328982-
dc.identifier.volume39-
dc.identifier.issue4-
dc.identifier.spage534-
dc.identifier.epage538-
dc.identifier.isiWOS:000579202700003-
dc.publisher.placeJapan-

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