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Article: Helium-ion-beam nanofabrication: extreme processes and applications
Title | Helium-ion-beam nanofabrication: extreme processes and applications |
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Authors | |
Issue Date | 2021 |
Publisher | IOP Publishing: Open Access Journals. The Journal's web site is located at https://iopscience.iop.org/journal/2631-7990 |
Citation | International Journal of Extreme Manufacturing, 2021, v. 3 n. 1, p. article no. 012001 How to Cite? |
Abstract | Helium ion beam (HIB) technology plays an important role in the extreme fields of nanofabrication. This paper reviews the latest developments in HIB technology as well as its extreme processing capabilities and widespread applications in nanofabrication. HIB-based nanofabrication includes direct-write milling, ion beam- induced deposition, and direct-write lithography without resist assistance. HIB nanoscale applications have also been evaluated in the areas of integrated circuits, materials sciences, nano-optics, and biological sciences. This review covers four thematic applications of HIB: (1) helium ion microscopy imaging for biological samples and semiconductors; (2) HIB milling and swelling for 2D/3D nanopore fabrication; (3) HIB-induced deposition for nanopillars, nanowires, and 3D nanostructures; (4) additional HIB direct writing for resist, graphene, and plasmonic nanostructures. This paper concludes with a summary of potential future applications and areas of improvement for HIB extreme nanofabrication technology. |
Persistent Identifier | http://hdl.handle.net/10722/304257 |
ISSN | 2023 Impact Factor: 16.1 2023 SCImago Journal Rankings: 2.654 |
ISI Accession Number ID |
DC Field | Value | Language |
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dc.contributor.author | He, S | - |
dc.contributor.author | Tian, R | - |
dc.contributor.author | Wu, W | - |
dc.contributor.author | Li, WD | - |
dc.contributor.author | Wang, D | - |
dc.date.accessioned | 2021-09-23T08:57:27Z | - |
dc.date.available | 2021-09-23T08:57:27Z | - |
dc.date.issued | 2021 | - |
dc.identifier.citation | International Journal of Extreme Manufacturing, 2021, v. 3 n. 1, p. article no. 012001 | - |
dc.identifier.issn | 2631-8644 | - |
dc.identifier.uri | http://hdl.handle.net/10722/304257 | - |
dc.description.abstract | Helium ion beam (HIB) technology plays an important role in the extreme fields of nanofabrication. This paper reviews the latest developments in HIB technology as well as its extreme processing capabilities and widespread applications in nanofabrication. HIB-based nanofabrication includes direct-write milling, ion beam- induced deposition, and direct-write lithography without resist assistance. HIB nanoscale applications have also been evaluated in the areas of integrated circuits, materials sciences, nano-optics, and biological sciences. This review covers four thematic applications of HIB: (1) helium ion microscopy imaging for biological samples and semiconductors; (2) HIB milling and swelling for 2D/3D nanopore fabrication; (3) HIB-induced deposition for nanopillars, nanowires, and 3D nanostructures; (4) additional HIB direct writing for resist, graphene, and plasmonic nanostructures. This paper concludes with a summary of potential future applications and areas of improvement for HIB extreme nanofabrication technology. | - |
dc.language | eng | - |
dc.publisher | IOP Publishing: Open Access Journals. The Journal's web site is located at https://iopscience.iop.org/journal/2631-7990 | - |
dc.relation.ispartof | International Journal of Extreme Manufacturing | - |
dc.rights | This work is licensed under a Creative Commons Attribution-NonCommercial-NoDerivatives 4.0 International License. | - |
dc.title | Helium-ion-beam nanofabrication: extreme processes and applications | - |
dc.type | Article | - |
dc.identifier.email | Li, WD: liwd@hku.hk | - |
dc.identifier.authority | Li, WD=rp01581 | - |
dc.description.nature | published_or_final_version | - |
dc.identifier.doi | 10.1088/2631-7990/abc673 | - |
dc.identifier.scopus | eid_2-s2.0-85097083366 | - |
dc.identifier.hkuros | 325713 | - |
dc.identifier.volume | 3 | - |
dc.identifier.issue | 1 | - |
dc.identifier.spage | article no. 012001 | - |
dc.identifier.epage | article no. 012001 | - |
dc.identifier.isi | WOS:000674745100003 | - |
dc.publisher.place | United Kingdom | - |