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- Publisher Website: 10.1063/1.116821
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Article: The mechanism of texture formation during film growth: The roles of preferential sputtering and shadowing
Title | The mechanism of texture formation during film growth: The roles of preferential sputtering and shadowing |
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Authors | |
Issue Date | 1996 |
Citation | Applied Physics Letters, 1996, v. 69, n. 20, p. 3007-3009 How to Cite? |
Abstract | Nonequilibrium molecular dynamics simulations have been employed to develop a mechanistic model for the development of an out-plane (fiber) texture in polcrystalline thin films. The depositing atoms preferentially sputter film atoms from grains with high surface energies. As the film grows, an atomic shadowing mechanism leads to the lateral growth of the grains with a height advantage - eventually leading to the occlusion of randomly oriented grains. © 1996 American Institute of Physics. |
Persistent Identifier | http://hdl.handle.net/10722/303794 |
ISSN | 2023 Impact Factor: 3.5 2023 SCImago Journal Rankings: 0.976 |
ISI Accession Number ID |
DC Field | Value | Language |
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dc.contributor.author | Ying, Feng | - |
dc.contributor.author | Smith, Richard W. | - |
dc.contributor.author | Srolovitz, David J. | - |
dc.date.accessioned | 2021-09-15T08:26:02Z | - |
dc.date.available | 2021-09-15T08:26:02Z | - |
dc.date.issued | 1996 | - |
dc.identifier.citation | Applied Physics Letters, 1996, v. 69, n. 20, p. 3007-3009 | - |
dc.identifier.issn | 0003-6951 | - |
dc.identifier.uri | http://hdl.handle.net/10722/303794 | - |
dc.description.abstract | Nonequilibrium molecular dynamics simulations have been employed to develop a mechanistic model for the development of an out-plane (fiber) texture in polcrystalline thin films. The depositing atoms preferentially sputter film atoms from grains with high surface energies. As the film grows, an atomic shadowing mechanism leads to the lateral growth of the grains with a height advantage - eventually leading to the occlusion of randomly oriented grains. © 1996 American Institute of Physics. | - |
dc.language | eng | - |
dc.relation.ispartof | Applied Physics Letters | - |
dc.title | The mechanism of texture formation during film growth: The roles of preferential sputtering and shadowing | - |
dc.type | Article | - |
dc.description.nature | link_to_subscribed_fulltext | - |
dc.identifier.doi | 10.1063/1.116821 | - |
dc.identifier.scopus | eid_2-s2.0-0000752486 | - |
dc.identifier.volume | 69 | - |
dc.identifier.issue | 20 | - |
dc.identifier.spage | 3007 | - |
dc.identifier.epage | 3009 | - |
dc.identifier.isi | WOS:A1996VR33900019 | - |