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Article: Grain growth stagnation in thin films due to shear-coupled grain boundary migration

TitleGrain growth stagnation in thin films due to shear-coupled grain boundary migration
Authors
KeywordsGrain growth
Grain boundary migration
Thin films
Disclinations
Issue Date2020
Citation
Scripta Materialia, 2020, v. 180, p. 83-87 How to Cite?
AbstractNormal grain growth in thin films attached to a substrate has been considered. It has been shown that shear-coupled grain boundary migration results in the build-up of elastic stresses in the film. A semi-quantitative model of grain growth combining the elements of disclinations theory with the Burke-Turnbull model of normal grain growth has been proposed. It has been shown that shear-coupled grain boundary migration may lead to stagnation of normal grain growth, whereas for high coupling factor values, the grains in the film do not grow at all. Finally, the mechanisms of stress relaxation enabling some grain growth are discussed.
DescriptionAccepted manuscript is available on the publisher website.
Persistent Identifierhttp://hdl.handle.net/10722/303649
ISSN
2023 Impact Factor: 5.3
2023 SCImago Journal Rankings: 1.738
ISI Accession Number ID

 

DC FieldValueLanguage
dc.contributor.authorRabkin, Eugen-
dc.contributor.authorSrolovitz, David J.-
dc.date.accessioned2021-09-15T08:25:44Z-
dc.date.available2021-09-15T08:25:44Z-
dc.date.issued2020-
dc.identifier.citationScripta Materialia, 2020, v. 180, p. 83-87-
dc.identifier.issn1359-6462-
dc.identifier.urihttp://hdl.handle.net/10722/303649-
dc.descriptionAccepted manuscript is available on the publisher website.-
dc.description.abstractNormal grain growth in thin films attached to a substrate has been considered. It has been shown that shear-coupled grain boundary migration results in the build-up of elastic stresses in the film. A semi-quantitative model of grain growth combining the elements of disclinations theory with the Burke-Turnbull model of normal grain growth has been proposed. It has been shown that shear-coupled grain boundary migration may lead to stagnation of normal grain growth, whereas for high coupling factor values, the grains in the film do not grow at all. Finally, the mechanisms of stress relaxation enabling some grain growth are discussed.-
dc.languageeng-
dc.relation.ispartofScripta Materialia-
dc.subjectGrain growth-
dc.subjectGrain boundary migration-
dc.subjectThin films-
dc.subjectDisclinations-
dc.titleGrain growth stagnation in thin films due to shear-coupled grain boundary migration-
dc.typeArticle-
dc.description.naturelink_to_OA_fulltext-
dc.identifier.doi10.1016/j.scriptamat.2020.01.019-
dc.identifier.scopuseid_2-s2.0-85078922234-
dc.identifier.volume180-
dc.identifier.spage83-
dc.identifier.epage87-
dc.identifier.isiWOS:000517662100016-

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