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Article: Impurity effects on adhesion

TitleImpurity effects on adhesion
Authors
Hong, T.Smith, J. R.Srolovitz, D. J.
Issue Date1993
Citation
Physical Review Letters, 1993, v. 70, n. 5, p. 615-618 How to Cite?
DOI: http://dx.doi.org/10.1103/PhysRevLett.70.615
AbstractWe report a first-principles calculation of impurity effects on adhesion. C, O, B, and S impurities all cause a pronounced decrease in the adhesive energies of the Mo/MoSi2(001) heterophase interface. S decreases the peak interfacial strength, while C, O, and B increase it. All impurities increase interfacial spacing in proportion to their covalent radii. Impurity mechanisms are identified. © 1993 The American Physical Society.
Persistent Identifierhttp://hdl.handle.net/10722/303329
ISSN
0031-9007
2021 Impact Factor: 9.185
2020 SCImago Journal Rankings: 3.688
ISI Accession Number ID
WOS:A1993KK24800025

 

DC FieldValueLanguage
dc.contributor.authorHong, T.-
dc.contributor.authorSmith, J. R.-
dc.contributor.authorSrolovitz, D. J.-
dc.date.accessioned2021-09-15T08:25:05Z-
dc.date.available2021-09-15T08:25:05Z-
dc.date.issued1993-
dc.identifier.citationPhysical Review Letters, 1993, v. 70, n. 5, p. 615-618-
dc.identifier.issn0031-9007-
dc.identifier.urihttp://hdl.handle.net/10722/303329-
dc.description.abstractWe report a first-principles calculation of impurity effects on adhesion. C, O, B, and S impurities all cause a pronounced decrease in the adhesive energies of the Mo/MoSi2(001) heterophase interface. S decreases the peak interfacial strength, while C, O, and B increase it. All impurities increase interfacial spacing in proportion to their covalent radii. Impurity mechanisms are identified. © 1993 The American Physical Society.-
dc.languageeng-
dc.relation.ispartofPhysical Review Letters-
dc.titleImpurity effects on adhesion-
dc.typeArticle-
dc.description.naturelink_to_subscribed_fulltext-
dc.identifier.doi10.1103/PhysRevLett.70.615-
dc.identifier.scopuseid_2-s2.0-4244079329-
dc.identifier.volume70-
dc.identifier.issue5-
dc.identifier.spage615-
dc.identifier.epage618-
dc.identifier.isiWOS:A1993KK24800025-

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