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Article: Resonant tunneling through discrete quantum states in stacked atomic-layered MoS2
Title | Resonant tunneling through discrete quantum states in stacked atomic-layered MoS<inf>2</inf> |
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Authors | |
Keywords | interlayer electron transport resonant tunneling discrete energy levels nanopore structure Metal transition dichalcogenide |
Issue Date | 2014 |
Citation | Nano Letters, 2014, v. 14, n. 5, p. 2381-2386 How to Cite? |
Abstract | Two-dimensional crystals can be assembled into three-dimensional stacks with atomic layer precision, which have already shown plenty of fascinating physical phenomena and been used for prototype vertical-field-effect- transistors.1,2 In this work, interlayer electron tunneling in stacked high-quality crystalline MoS films were investigated. A trilayered MoS film was sandwiched between top and bottom electrodes with an adjacent bottom gate, and the discrete energy levels in each layer could be tuned by bias and gate voltages. When the discrete energy levels aligned, a resonant tunneling peak appeared in the current-voltage characteristics. The peak position shifts linearly with perpendicular magnetic field, indicating formation of Landau levels. From this linear dependence, the effective mass and Fermi velocity are determined and are confirmed by electronic structure calculations. These fundamental parameters are useful for exploitation of its unique properties. © 2014 American Chemical Society. 2 2 |
Persistent Identifier | http://hdl.handle.net/10722/298438 |
ISSN | 2023 Impact Factor: 9.6 2023 SCImago Journal Rankings: 3.411 |
ISI Accession Number ID |
DC Field | Value | Language |
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dc.contributor.author | Nguyen, Linh Nam | - |
dc.contributor.author | Lan, Yann Wen | - |
dc.contributor.author | Chen, Jyun Hong | - |
dc.contributor.author | Chang, Tay Rong | - |
dc.contributor.author | Zhong, Yuan Liang | - |
dc.contributor.author | Jeng, Horng Tay | - |
dc.contributor.author | Li, Lain Jong | - |
dc.contributor.author | Chen, Chii Dong | - |
dc.date.accessioned | 2021-04-08T03:08:25Z | - |
dc.date.available | 2021-04-08T03:08:25Z | - |
dc.date.issued | 2014 | - |
dc.identifier.citation | Nano Letters, 2014, v. 14, n. 5, p. 2381-2386 | - |
dc.identifier.issn | 1530-6984 | - |
dc.identifier.uri | http://hdl.handle.net/10722/298438 | - |
dc.description.abstract | Two-dimensional crystals can be assembled into three-dimensional stacks with atomic layer precision, which have already shown plenty of fascinating physical phenomena and been used for prototype vertical-field-effect- transistors.1,2 In this work, interlayer electron tunneling in stacked high-quality crystalline MoS films were investigated. A trilayered MoS film was sandwiched between top and bottom electrodes with an adjacent bottom gate, and the discrete energy levels in each layer could be tuned by bias and gate voltages. When the discrete energy levels aligned, a resonant tunneling peak appeared in the current-voltage characteristics. The peak position shifts linearly with perpendicular magnetic field, indicating formation of Landau levels. From this linear dependence, the effective mass and Fermi velocity are determined and are confirmed by electronic structure calculations. These fundamental parameters are useful for exploitation of its unique properties. © 2014 American Chemical Society. 2 2 | - |
dc.language | eng | - |
dc.relation.ispartof | Nano Letters | - |
dc.subject | interlayer electron transport | - |
dc.subject | resonant tunneling | - |
dc.subject | discrete energy levels | - |
dc.subject | nanopore structure | - |
dc.subject | Metal transition dichalcogenide | - |
dc.title | Resonant tunneling through discrete quantum states in stacked atomic-layered MoS<inf>2</inf> | - |
dc.type | Article | - |
dc.description.nature | link_to_subscribed_fulltext | - |
dc.identifier.doi | 10.1021/nl404790n | - |
dc.identifier.scopus | eid_2-s2.0-84900506644 | - |
dc.identifier.volume | 14 | - |
dc.identifier.issue | 5 | - |
dc.identifier.spage | 2381 | - |
dc.identifier.epage | 2386 | - |
dc.identifier.eissn | 1530-6992 | - |
dc.identifier.isi | WOS:000336074800022 | - |
dc.identifier.issnl | 1530-6984 | - |