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- Publisher Website: 10.1021/nn405719x
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Article: Large-area synthesis of highly crystalline WSe2 monolayers and device applications
Title | Large-area synthesis of highly crystalline WSe<inf>2</inf> monolayers and device applications |
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Authors | |
Keywords | two-dimensional materials transition metal dichalcogenides layered materials tungsten diselenides inverters transistors |
Issue Date | 2014 |
Citation | ACS Nano, 2014, v. 8, n. 1, p. 923-930 How to Cite? |
Abstract | The monolayer transition metal dichalcogenides have recently attracted much attention owing to their potential in valleytronics, flexible and low-power electronics, and optoelectronic devices. Recent reports have demonstrated the growth of large-size two-dimensional MoS layers by the sulfurization of molybdenum oxides. However, the growth of a transition metal selenide monolayer has still been a challenge. Here we report that the introduction of hydrogen in the reaction chamber helps to activate the selenization of WO , where large-size WSe monolayer flakes or thin films can be successfully grown. The top-gated field-effect transistors based on WSe monolayers using ionic gels as the dielectrics exhibit ambipolar characteristics, where the hole and electron mobility values are up to 90 and 7 cm /Vs, respectively. These films can be transferred onto arbitrary substrates, which may inspire research efforts to explore their properties and applications. The resistor-loaded inverter based on a WSe film, with a gain of ∼13, further demonstrates its applicability for logic-circuit integrations. © 2013 American Chemical Society. 2 3 2 2 2 2 |
Persistent Identifier | http://hdl.handle.net/10722/298068 |
ISSN | 2023 Impact Factor: 15.8 2023 SCImago Journal Rankings: 4.593 |
ISI Accession Number ID |
DC Field | Value | Language |
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dc.contributor.author | Huang, Jing Kai | - |
dc.contributor.author | Pu, Jiang | - |
dc.contributor.author | Hsu, Chang Lung | - |
dc.contributor.author | Chiu, Ming Hui | - |
dc.contributor.author | Juang, Zhen Yu | - |
dc.contributor.author | Chang, Yung Huang | - |
dc.contributor.author | Chang, Wen Hao | - |
dc.contributor.author | Iwasa, Yoshihiro | - |
dc.contributor.author | Takenobu, Taishi | - |
dc.contributor.author | Li, Lain Jong | - |
dc.date.accessioned | 2021-04-08T03:07:35Z | - |
dc.date.available | 2021-04-08T03:07:35Z | - |
dc.date.issued | 2014 | - |
dc.identifier.citation | ACS Nano, 2014, v. 8, n. 1, p. 923-930 | - |
dc.identifier.issn | 1936-0851 | - |
dc.identifier.uri | http://hdl.handle.net/10722/298068 | - |
dc.description.abstract | The monolayer transition metal dichalcogenides have recently attracted much attention owing to their potential in valleytronics, flexible and low-power electronics, and optoelectronic devices. Recent reports have demonstrated the growth of large-size two-dimensional MoS layers by the sulfurization of molybdenum oxides. However, the growth of a transition metal selenide monolayer has still been a challenge. Here we report that the introduction of hydrogen in the reaction chamber helps to activate the selenization of WO , where large-size WSe monolayer flakes or thin films can be successfully grown. The top-gated field-effect transistors based on WSe monolayers using ionic gels as the dielectrics exhibit ambipolar characteristics, where the hole and electron mobility values are up to 90 and 7 cm /Vs, respectively. These films can be transferred onto arbitrary substrates, which may inspire research efforts to explore their properties and applications. The resistor-loaded inverter based on a WSe film, with a gain of ∼13, further demonstrates its applicability for logic-circuit integrations. © 2013 American Chemical Society. 2 3 2 2 2 2 | - |
dc.language | eng | - |
dc.relation.ispartof | ACS Nano | - |
dc.subject | two-dimensional materials | - |
dc.subject | transition metal dichalcogenides | - |
dc.subject | layered materials | - |
dc.subject | tungsten diselenides | - |
dc.subject | inverters | - |
dc.subject | transistors | - |
dc.title | Large-area synthesis of highly crystalline WSe<inf>2</inf> monolayers and device applications | - |
dc.type | Article | - |
dc.description.nature | link_to_subscribed_fulltext | - |
dc.identifier.doi | 10.1021/nn405719x | - |
dc.identifier.scopus | eid_2-s2.0-84893479161 | - |
dc.identifier.volume | 8 | - |
dc.identifier.issue | 1 | - |
dc.identifier.spage | 923 | - |
dc.identifier.epage | 930 | - |
dc.identifier.eissn | 1936-086X | - |
dc.identifier.isi | WOS:000330542900096 | - |
dc.identifier.issnl | 1936-0851 | - |