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Article: Large-area synthesis of highly crystalline WSe2 monolayers and device applications

TitleLarge-area synthesis of highly crystalline WSe<inf>2</inf> monolayers and device applications
Authors
Keywordstwo-dimensional materials
transition metal dichalcogenides
layered materials
tungsten diselenides
inverters
transistors
Issue Date2014
Citation
ACS Nano, 2014, v. 8, n. 1, p. 923-930 How to Cite?
AbstractThe monolayer transition metal dichalcogenides have recently attracted much attention owing to their potential in valleytronics, flexible and low-power electronics, and optoelectronic devices. Recent reports have demonstrated the growth of large-size two-dimensional MoS layers by the sulfurization of molybdenum oxides. However, the growth of a transition metal selenide monolayer has still been a challenge. Here we report that the introduction of hydrogen in the reaction chamber helps to activate the selenization of WO , where large-size WSe monolayer flakes or thin films can be successfully grown. The top-gated field-effect transistors based on WSe monolayers using ionic gels as the dielectrics exhibit ambipolar characteristics, where the hole and electron mobility values are up to 90 and 7 cm /Vs, respectively. These films can be transferred onto arbitrary substrates, which may inspire research efforts to explore their properties and applications. The resistor-loaded inverter based on a WSe film, with a gain of ∼13, further demonstrates its applicability for logic-circuit integrations. © 2013 American Chemical Society. 2 3 2 2 2 2
Persistent Identifierhttp://hdl.handle.net/10722/298068
ISSN
2023 Impact Factor: 15.8
2023 SCImago Journal Rankings: 4.593
ISI Accession Number ID

 

DC FieldValueLanguage
dc.contributor.authorHuang, Jing Kai-
dc.contributor.authorPu, Jiang-
dc.contributor.authorHsu, Chang Lung-
dc.contributor.authorChiu, Ming Hui-
dc.contributor.authorJuang, Zhen Yu-
dc.contributor.authorChang, Yung Huang-
dc.contributor.authorChang, Wen Hao-
dc.contributor.authorIwasa, Yoshihiro-
dc.contributor.authorTakenobu, Taishi-
dc.contributor.authorLi, Lain Jong-
dc.date.accessioned2021-04-08T03:07:35Z-
dc.date.available2021-04-08T03:07:35Z-
dc.date.issued2014-
dc.identifier.citationACS Nano, 2014, v. 8, n. 1, p. 923-930-
dc.identifier.issn1936-0851-
dc.identifier.urihttp://hdl.handle.net/10722/298068-
dc.description.abstractThe monolayer transition metal dichalcogenides have recently attracted much attention owing to their potential in valleytronics, flexible and low-power electronics, and optoelectronic devices. Recent reports have demonstrated the growth of large-size two-dimensional MoS layers by the sulfurization of molybdenum oxides. However, the growth of a transition metal selenide monolayer has still been a challenge. Here we report that the introduction of hydrogen in the reaction chamber helps to activate the selenization of WO , where large-size WSe monolayer flakes or thin films can be successfully grown. The top-gated field-effect transistors based on WSe monolayers using ionic gels as the dielectrics exhibit ambipolar characteristics, where the hole and electron mobility values are up to 90 and 7 cm /Vs, respectively. These films can be transferred onto arbitrary substrates, which may inspire research efforts to explore their properties and applications. The resistor-loaded inverter based on a WSe film, with a gain of ∼13, further demonstrates its applicability for logic-circuit integrations. © 2013 American Chemical Society. 2 3 2 2 2 2-
dc.languageeng-
dc.relation.ispartofACS Nano-
dc.subjecttwo-dimensional materials-
dc.subjecttransition metal dichalcogenides-
dc.subjectlayered materials-
dc.subjecttungsten diselenides-
dc.subjectinverters-
dc.subjecttransistors-
dc.titleLarge-area synthesis of highly crystalline WSe<inf>2</inf> monolayers and device applications-
dc.typeArticle-
dc.description.naturelink_to_subscribed_fulltext-
dc.identifier.doi10.1021/nn405719x-
dc.identifier.scopuseid_2-s2.0-84893479161-
dc.identifier.volume8-
dc.identifier.issue1-
dc.identifier.spage923-
dc.identifier.epage930-
dc.identifier.eissn1936-086X-
dc.identifier.isiWOS:000330542900096-
dc.identifier.issnl1936-0851-

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