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Article: Energy-Efficient Monolithic 3-D SRAM Cell with BEOL MoS2FETs for SoC Scaling

TitleEnergy-Efficient Monolithic 3-D SRAM Cell with BEOL MoS<inf>2</inf>FETs for SoC Scaling
Authors
Keywordsback-end-of-The-line (BEOL)
energy efficiency
SRAM
area efficiency
2-D material
monolithic 3-D (M3D) integration
Issue Date2020
Citation
IEEE Transactions on Electron Devices, 2020, v. 67, n. 10, p. 4216-4221 How to Cite?
AbstractIn this article, we propose an energy-efficient monolithic 3-D (M3D) three-Tier SRAM cell with back-end-of-The-line (BEOL) back-gated (BG) MoS2 FETs. The impacts of wire routing resistance and capacitance, gate topology of MoS2 FETs, and the layout optimization of multitier 6T SRAM cells have been comprehensively analyzed for SoC scaling through system-Technology co-optimization. SRAM plays an integral role in the performance of SoCs, and the performance can be improved by SRAM on logic integration. Compared with one-Tier BG SRAM cell design, the proposed monolithic three-Tier BG SRAM cell releases the impact of metal line resistance and shows a 44.3% reduction in cell area, 28.4% improvement in read access time, 21.3% improvement in dynamic energy, and 43.6% improvement in energy-delay product. The energy-and area-efficient three-Tier BG SRAM cell enables intelligent functionalities for the area-and energy-constrained edge computing devices.
Persistent Identifierhttp://hdl.handle.net/10722/297982
ISSN
2023 Impact Factor: 2.9
2023 SCImago Journal Rankings: 0.785
ISI Accession Number ID

 

DC FieldValueLanguage
dc.contributor.authorHu, Vita Pi Ho-
dc.contributor.authorSu, Cheng Wei-
dc.contributor.authorLee, Yen Wei-
dc.contributor.authorHo, Tun Yi-
dc.contributor.authorCheng, Chao Ching-
dc.contributor.authorChen, Tzu Chiang-
dc.contributor.authorHung, Terry Yi Tse-
dc.contributor.authorLi, Jin Fu-
dc.contributor.authorChen, Yu Guang-
dc.contributor.authorLi, Lain Jong-
dc.date.accessioned2021-04-08T03:07:24Z-
dc.date.available2021-04-08T03:07:24Z-
dc.date.issued2020-
dc.identifier.citationIEEE Transactions on Electron Devices, 2020, v. 67, n. 10, p. 4216-4221-
dc.identifier.issn0018-9383-
dc.identifier.urihttp://hdl.handle.net/10722/297982-
dc.description.abstractIn this article, we propose an energy-efficient monolithic 3-D (M3D) three-Tier SRAM cell with back-end-of-The-line (BEOL) back-gated (BG) MoS2 FETs. The impacts of wire routing resistance and capacitance, gate topology of MoS2 FETs, and the layout optimization of multitier 6T SRAM cells have been comprehensively analyzed for SoC scaling through system-Technology co-optimization. SRAM plays an integral role in the performance of SoCs, and the performance can be improved by SRAM on logic integration. Compared with one-Tier BG SRAM cell design, the proposed monolithic three-Tier BG SRAM cell releases the impact of metal line resistance and shows a 44.3% reduction in cell area, 28.4% improvement in read access time, 21.3% improvement in dynamic energy, and 43.6% improvement in energy-delay product. The energy-and area-efficient three-Tier BG SRAM cell enables intelligent functionalities for the area-and energy-constrained edge computing devices.-
dc.languageeng-
dc.relation.ispartofIEEE Transactions on Electron Devices-
dc.subjectback-end-of-The-line (BEOL)-
dc.subjectenergy efficiency-
dc.subjectSRAM-
dc.subjectarea efficiency-
dc.subject2-D material-
dc.subjectmonolithic 3-D (M3D) integration-
dc.titleEnergy-Efficient Monolithic 3-D SRAM Cell with BEOL MoS<inf>2</inf>FETs for SoC Scaling-
dc.typeArticle-
dc.description.naturelink_to_subscribed_fulltext-
dc.identifier.doi10.1109/TED.2020.3018099-
dc.identifier.scopuseid_2-s2.0-85092167265-
dc.identifier.volume67-
dc.identifier.issue10-
dc.identifier.spage4216-
dc.identifier.epage4221-
dc.identifier.eissn1557-9646-
dc.identifier.isiWOS:000572635400045-
dc.identifier.issnl0018-9383-

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