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Article: Rapid thermal annealing assisted facile solution method for tungsten-doped vanadium dioxide thin films on glass substrate

TitleRapid thermal annealing assisted facile solution method for tungsten-doped vanadium dioxide thin films on glass substrate
Authors
KeywordsVanadium dioxide
Thermochromic start window
Solution processing
Spin coating
Rapid thermal annealing
Issue Date2020
PublisherElsevier BV. The Journal's web site is located at http://www.elsevier.com/locate/jallcom
Citation
Journal of Alloys and Compounds, 2020, v. 833, p. article no. 155053 How to Cite?
AbstractVanadium dioxide VO2 is an important thermochromic material with useful applications in smart energy devices. This paper describes the synthesis of high-quality vanadium dioxide thermochromic thin films directly on glass substrate without any barrier layer prepared using a simple solution method. We demonstrate that 50 nm thick VO2 films display excellent visible transmittance (76.9% on glass, 69.4% on fused silica) and a large NIR switching efficiency (33.8% on glass, 44.3% on fused silica) at 1600 nm. It is found that the metal to semiconductor phase transition temperature Tc of undoped films can be reduced from a theoretical value of 68 °C to 49.4 °C by rapid thermal annealing. With W doping a continuous drop in the Tc is observed and for VO2 with 2% W doping, a Tc of 25.8 °C is achieved. These good optical properties and the near room-temperature phase transition temperature suggest that solution processing with the rapid thermal annealing process is a feasible method to obtain this promising material on glass substrate for practical application in thermochromic smart windows.
Persistent Identifierhttp://hdl.handle.net/10722/289267
ISSN
2020 Impact Factor: 5.316
2015 SCImago Journal Rankings: 1.006
ISI Accession Number ID

 

DC FieldValueLanguage
dc.contributor.authorKong, M-
dc.contributor.authorEgbo, K-
dc.contributor.authorLiu, CP-
dc.contributor.authorHossain, MK-
dc.contributor.authorTso, CY-
dc.contributor.authorChao, CYH-
dc.contributor.authorYu, KM-
dc.date.accessioned2020-10-22T08:10:14Z-
dc.date.available2020-10-22T08:10:14Z-
dc.date.issued2020-
dc.identifier.citationJournal of Alloys and Compounds, 2020, v. 833, p. article no. 155053-
dc.identifier.issn0925-8388-
dc.identifier.urihttp://hdl.handle.net/10722/289267-
dc.description.abstractVanadium dioxide VO2 is an important thermochromic material with useful applications in smart energy devices. This paper describes the synthesis of high-quality vanadium dioxide thermochromic thin films directly on glass substrate without any barrier layer prepared using a simple solution method. We demonstrate that 50 nm thick VO2 films display excellent visible transmittance (76.9% on glass, 69.4% on fused silica) and a large NIR switching efficiency (33.8% on glass, 44.3% on fused silica) at 1600 nm. It is found that the metal to semiconductor phase transition temperature Tc of undoped films can be reduced from a theoretical value of 68 °C to 49.4 °C by rapid thermal annealing. With W doping a continuous drop in the Tc is observed and for VO2 with 2% W doping, a Tc of 25.8 °C is achieved. These good optical properties and the near room-temperature phase transition temperature suggest that solution processing with the rapid thermal annealing process is a feasible method to obtain this promising material on glass substrate for practical application in thermochromic smart windows.-
dc.languageeng-
dc.publisherElsevier BV. The Journal's web site is located at http://www.elsevier.com/locate/jallcom-
dc.relation.ispartofJournal of Alloys and Compounds-
dc.subjectVanadium dioxide-
dc.subjectThermochromic start window-
dc.subjectSolution processing-
dc.subjectSpin coating-
dc.subjectRapid thermal annealing-
dc.titleRapid thermal annealing assisted facile solution method for tungsten-doped vanadium dioxide thin films on glass substrate-
dc.typeArticle-
dc.identifier.emailChao, CYH: cyhchao@hku.hk-
dc.identifier.authorityChao, CYH=rp02396-
dc.description.naturelink_to_subscribed_fulltext-
dc.identifier.doi10.1016/j.jallcom.2020.155053-
dc.identifier.scopuseid_2-s2.0-85083107668-
dc.identifier.hkuros316090-
dc.identifier.volume833-
dc.identifier.spagearticle no. 155053-
dc.identifier.epagearticle no. 155053-
dc.identifier.isiWOS:000535178400005-
dc.publisher.placeNetherlands-
dc.identifier.issnl0925-8388-

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