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Article: Effect of etching with potassium hydrogen difluoride and ammonium hydrogen difluoride on bonding of a tri-n-butylborane initiated resin to zirconia

TitleEffect of etching with potassium hydrogen difluoride and ammonium hydrogen difluoride on bonding of a tri-n-butylborane initiated resin to zirconia
Authors
KeywordsAmmonium hydrogen difluoride
Bonding
Potassium hydrogen difluoride
Tri-n-butylborane
Zirconia
Issue Date2019
PublisherNihon Shika Riko Gakkai. The Journal's web site is located at http://www.jsdmd.jp/allpdf.html
Citation
Dental Materials Journal, 2019, v. 38 n. 4, p. 540-546 How to Cite?
AbstractThe purpose of the current study was to evaluate the effect of etching with potassium hydrogen difluoride (KHF2) and ammonium hydrogen difluoride (NH4HF2) on the bond strength of a self-polymerizing methyl methacrylate resin (MMA-TBB) bonded to zirconia. Zirconia disks were prepared using the following surface treatment: no treatment, alumina blasting, and etching with KHF2 or NH4HF2. The specimens were bonded with the MMA-TBB. The shear bond (Ø=5 mm) strength was measured. The surface free energies of the specimens were determined by measuring contact angles. The KHF2 and NH4HF2 groups exhibited higher shear bond strength and surface free energy than did the alumina blasting and no treatment groups. Compared with alumina blasting, etching with KHF2 and NH4HF2 exhibited superior bonding ability of mechanical retention to zirconia.
DescriptionLink to Free access
Persistent Identifierhttp://hdl.handle.net/10722/277972
ISSN
2023 Impact Factor: 1.9
2023 SCImago Journal Rankings: 0.589
ISI Accession Number ID

 

DC FieldValueLanguage
dc.contributor.authorAkagawa, N-
dc.contributor.authorKoizumi, H-
dc.contributor.authorNogawa, H-
dc.contributor.authorKodaira, A-
dc.contributor.authorBurrow, MF-
dc.contributor.authorMatsumura, H-
dc.date.accessioned2019-10-04T08:04:57Z-
dc.date.available2019-10-04T08:04:57Z-
dc.date.issued2019-
dc.identifier.citationDental Materials Journal, 2019, v. 38 n. 4, p. 540-546-
dc.identifier.issn0287-4547-
dc.identifier.urihttp://hdl.handle.net/10722/277972-
dc.descriptionLink to Free access-
dc.description.abstractThe purpose of the current study was to evaluate the effect of etching with potassium hydrogen difluoride (KHF2) and ammonium hydrogen difluoride (NH4HF2) on the bond strength of a self-polymerizing methyl methacrylate resin (MMA-TBB) bonded to zirconia. Zirconia disks were prepared using the following surface treatment: no treatment, alumina blasting, and etching with KHF2 or NH4HF2. The specimens were bonded with the MMA-TBB. The shear bond (Ø=5 mm) strength was measured. The surface free energies of the specimens were determined by measuring contact angles. The KHF2 and NH4HF2 groups exhibited higher shear bond strength and surface free energy than did the alumina blasting and no treatment groups. Compared with alumina blasting, etching with KHF2 and NH4HF2 exhibited superior bonding ability of mechanical retention to zirconia.-
dc.languageeng-
dc.publisherNihon Shika Riko Gakkai. The Journal's web site is located at http://www.jsdmd.jp/allpdf.html-
dc.relation.ispartofDental Materials Journal-
dc.subjectAmmonium hydrogen difluoride-
dc.subjectBonding-
dc.subjectPotassium hydrogen difluoride-
dc.subjectTri-n-butylborane-
dc.subjectZirconia-
dc.titleEffect of etching with potassium hydrogen difluoride and ammonium hydrogen difluoride on bonding of a tri-n-butylborane initiated resin to zirconia-
dc.typeArticle-
dc.identifier.emailBurrow, MF: mfburr58@hku.hk-
dc.identifier.authorityBurrow, MF=rp01306-
dc.description.naturelink_to_OA_fulltext-
dc.identifier.doi10.4012/dmj.2018-152-
dc.identifier.pmid31068549-
dc.identifier.scopuseid_2-s2.0-85070848757-
dc.identifier.hkuros306952-
dc.identifier.volume38-
dc.identifier.issue4-
dc.identifier.spage540-
dc.identifier.epage546-
dc.identifier.isiWOS:000489084300005-
dc.publisher.placeJapan-
dc.identifier.issnl0287-4547-

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