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Article: Efficient broadband highly dispersive HfO2/SiO2 multilayer mirror for pulse compression in near ultraviolet

TitleEfficient broadband highly dispersive HfO2/SiO2 multilayer mirror for pulse compression in near ultraviolet
Authors
Razskazovskaya, O.Hassan, M. ThLuu, T. T.Goulielmakis, E.Pervak, V.
Issue Date2016
Citation
Optics Express, 2016, v. 24, n. 12, p. 13628-13633 How to Cite?
DOI: http://dx.doi.org/10.1364/OE.24.013628
Abstract© 2016 Optical Society of America. We report on design, production and implementation of a highly dispersive broadband dielectric multilayer mirror covering near ultraviolet range from 290 nm to 350 nm. The described mirrors, having 92%spectrally averaged reflectance in the ultraviolet range and ∼ 85 fs of group delay difference, that allow compression to ∼ 7 fs, provide a strong foundation for generation of few-fs pulses in the near ultraviolet.
Persistent Identifierhttp://hdl.handle.net/10722/277035
ISI Accession Number ID
WOS:000378298400113

 

DC FieldValueLanguage
dc.contributor.authorRazskazovskaya, O.-
dc.contributor.authorHassan, M. Th-
dc.contributor.authorLuu, T. T.-
dc.contributor.authorGoulielmakis, E.-
dc.contributor.authorPervak, V.-
dc.date.accessioned2019-09-18T08:35:24Z-
dc.date.available2019-09-18T08:35:24Z-
dc.date.issued2016-
dc.identifier.citationOptics Express, 2016, v. 24, n. 12, p. 13628-13633-
dc.identifier.urihttp://hdl.handle.net/10722/277035-
dc.description.abstract© 2016 Optical Society of America. We report on design, production and implementation of a highly dispersive broadband dielectric multilayer mirror covering near ultraviolet range from 290 nm to 350 nm. The described mirrors, having 92%spectrally averaged reflectance in the ultraviolet range and ∼ 85 fs of group delay difference, that allow compression to ∼ 7 fs, provide a strong foundation for generation of few-fs pulses in the near ultraviolet.-
dc.languageeng-
dc.relation.ispartofOptics Express-
dc.titleEfficient broadband highly dispersive HfO2/SiO2 multilayer mirror for pulse compression in near ultraviolet-
dc.typeArticle-
dc.description.naturelink_to_OA_fulltext-
dc.identifier.doi10.1364/OE.24.013628-
dc.identifier.pmid27410378-
dc.identifier.scopuseid_2-s2.0-84977633636-
dc.identifier.volume24-
dc.identifier.issue12-
dc.identifier.spage13628-
dc.identifier.epage13633-
dc.identifier.eissn1094-4087-
dc.identifier.isiWOS:000378298400113-
dc.identifier.issnl1094-4087-

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