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Article: Optical metamaterials at near and mid-IR range fabricated by nanoimprint lithography

TitleOptical metamaterials at near and mid-IR range fabricated by nanoimprint lithography
Authors
KeywordsBlack Curve
Negative Refractive Index
Nanoimprint Lithography
FDTD Simulation
Negative Permeability
Issue Date2007
PublisherSpringer Verlag. The Journal's web site is located at http://link.springer.de/link/service/journals/00339/index.htm
Citation
Applied Physics A: materials science & processing, 2007, v. 87 n. 2, p. 143-150 How to Cite?
AbstractTwo types of optical metamaterials operating at near-IR and mid-IR frequencies, respectively, have been designed, fabricated by nanoimprint lithography (NIL), and characterized by laser spectroscopic ellipsometry. The structure for the near-IR range was a metal/dielectric/metal stack “fishnet” structure that demonstrated negative permittivity and permeability in the same frequency region and hence exhibited a negative refractive index at a wavelength near 1.7 μm. In the mid-IR range, the metamaterial was an ordered array of fourfold symmetric L-shaped resonators (LSRs) that showed both a dipole plasmon resonance resulting in negative permittivity and a magnetic resonance with negative permeability near wavelengths of 3.7 μm and 5.25 μm, respectively. The optical properties of both metamaterials are in agreement with theoretical predictions. This work demonstrates the feasibility of designing various optical negative-index metamaterials and fabricating them using the nanoimprint lithography as a low-cost, high-throughput fabrication approach.
Persistent Identifierhttp://hdl.handle.net/10722/262571
ISSN
2023 Impact Factor: 2.5
2023 SCImago Journal Rankings: 0.446
ISI Accession Number ID

 

DC FieldValueLanguage
dc.contributor.authorWu, W-
dc.contributor.authorKim, E-
dc.contributor.authorPonizovskaya, E-
dc.contributor.authorLiu, Y-
dc.contributor.authorYu, Z-
dc.contributor.authorFang, N-
dc.contributor.authorShen, YR-
dc.contributor.authorBratkovsky, AM-
dc.contributor.authorTong, W-
dc.contributor.authorSun, C-
dc.contributor.authorZhang, X-
dc.contributor.authorWang, S-Y-
dc.date.accessioned2018-10-02T06:50:04Z-
dc.date.available2018-10-02T06:50:04Z-
dc.date.issued2007-
dc.identifier.citationApplied Physics A: materials science & processing, 2007, v. 87 n. 2, p. 143-150-
dc.identifier.issn0947-8396-
dc.identifier.urihttp://hdl.handle.net/10722/262571-
dc.description.abstractTwo types of optical metamaterials operating at near-IR and mid-IR frequencies, respectively, have been designed, fabricated by nanoimprint lithography (NIL), and characterized by laser spectroscopic ellipsometry. The structure for the near-IR range was a metal/dielectric/metal stack “fishnet” structure that demonstrated negative permittivity and permeability in the same frequency region and hence exhibited a negative refractive index at a wavelength near 1.7 μm. In the mid-IR range, the metamaterial was an ordered array of fourfold symmetric L-shaped resonators (LSRs) that showed both a dipole plasmon resonance resulting in negative permittivity and a magnetic resonance with negative permeability near wavelengths of 3.7 μm and 5.25 μm, respectively. The optical properties of both metamaterials are in agreement with theoretical predictions. This work demonstrates the feasibility of designing various optical negative-index metamaterials and fabricating them using the nanoimprint lithography as a low-cost, high-throughput fabrication approach.-
dc.languageeng-
dc.publisherSpringer Verlag. The Journal's web site is located at http://link.springer.de/link/service/journals/00339/index.htm-
dc.relation.ispartofApplied Physics A: materials science & processing-
dc.rightsThe final publication is available at Springer via http://dx.doi.org/[insert DOI]-
dc.subjectBlack Curve-
dc.subjectNegative Refractive Index-
dc.subjectNanoimprint Lithography-
dc.subjectFDTD Simulation-
dc.subjectNegative Permeability-
dc.titleOptical metamaterials at near and mid-IR range fabricated by nanoimprint lithography-
dc.typeArticle-
dc.identifier.emailZhang, X: president@hku.hk-
dc.identifier.authorityZhang, X=rp02411-
dc.description.naturelink_to_subscribed_fulltext-
dc.identifier.doi10.1007/s00339-006-3834-3-
dc.identifier.scopuseid_2-s2.0-33947241015-
dc.identifier.volume87-
dc.identifier.issue2-
dc.identifier.spage143-
dc.identifier.epage150-
dc.identifier.isiWOS:000249502400002-
dc.publisher.placeGermany-
dc.identifier.issnl0947-8396-

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