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- Publisher Website: 10.1007/s10544-009-9329-1
- Scopus: eid_2-s2.0-70549092045
- PMID: 19495986
- WOS: WOS:000270679400019
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Article: Gradient lithography of engineered proteins to fabricate 2D and 3D cell culture microenvironments
Title | Gradient lithography of engineered proteins to fabricate 2D and 3D cell culture microenvironments |
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Authors | |
Keywords | Protein engineering Non-canonical amino acids DMD (digital micromirror device) Protein patterning Protein lithography Protein gradient |
Issue Date | 2009 |
Citation | Biomedical Microdevices, 2009, v. 11, n. 5, p. 1127-1134 How to Cite? |
Abstract | Spatial patterning of proteins is a valuable technique for many biological applications and is the prevailing tool for defining microenvironments for cells in culture, a required procedure in developmental biology and tissue engineering research. However, it is still challenging to achieve protein patterns that closely mimic native microenvironments, such as gradient protein distributions with desirable mechanical properties. By combining projection dynamic mask lithography and protein engineering with non-canonical photosensitive amino acids, we demonstrate a simple, scalable strategy to fabricate any user-defined 2D or 3D stable gradient pattern with complex geometries from an artificial extracellular matrix (aECM) protein. We show that the elastic modulus and chemical nature of the gradient profile are biocompatible and allow useful applications in cell biological research. © 2009 Springer Science+Business Media, LLC. |
Persistent Identifier | http://hdl.handle.net/10722/257313 |
ISSN | 2023 Impact Factor: 3.0 2023 SCImago Journal Rankings: 0.578 |
ISI Accession Number ID |
DC Field | Value | Language |
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dc.contributor.author | Wang, Sheng | - |
dc.contributor.author | Wong Po Foo, Cheryl | - |
dc.contributor.author | Warrier, Ajithkumar | - |
dc.contributor.author | Poo, Mu Ming | - |
dc.contributor.author | Heilshorn, Sarah C. | - |
dc.contributor.author | Zhang, Xiang | - |
dc.date.accessioned | 2018-07-24T08:59:26Z | - |
dc.date.available | 2018-07-24T08:59:26Z | - |
dc.date.issued | 2009 | - |
dc.identifier.citation | Biomedical Microdevices, 2009, v. 11, n. 5, p. 1127-1134 | - |
dc.identifier.issn | 1387-2176 | - |
dc.identifier.uri | http://hdl.handle.net/10722/257313 | - |
dc.description.abstract | Spatial patterning of proteins is a valuable technique for many biological applications and is the prevailing tool for defining microenvironments for cells in culture, a required procedure in developmental biology and tissue engineering research. However, it is still challenging to achieve protein patterns that closely mimic native microenvironments, such as gradient protein distributions with desirable mechanical properties. By combining projection dynamic mask lithography and protein engineering with non-canonical photosensitive amino acids, we demonstrate a simple, scalable strategy to fabricate any user-defined 2D or 3D stable gradient pattern with complex geometries from an artificial extracellular matrix (aECM) protein. We show that the elastic modulus and chemical nature of the gradient profile are biocompatible and allow useful applications in cell biological research. © 2009 Springer Science+Business Media, LLC. | - |
dc.language | eng | - |
dc.relation.ispartof | Biomedical Microdevices | - |
dc.subject | Protein engineering | - |
dc.subject | Non-canonical amino acids | - |
dc.subject | DMD (digital micromirror device) | - |
dc.subject | Protein patterning | - |
dc.subject | Protein lithography | - |
dc.subject | Protein gradient | - |
dc.title | Gradient lithography of engineered proteins to fabricate 2D and 3D cell culture microenvironments | - |
dc.type | Article | - |
dc.description.nature | link_to_subscribed_fulltext | - |
dc.identifier.doi | 10.1007/s10544-009-9329-1 | - |
dc.identifier.pmid | 19495986 | - |
dc.identifier.scopus | eid_2-s2.0-70549092045 | - |
dc.identifier.volume | 11 | - |
dc.identifier.issue | 5 | - |
dc.identifier.spage | 1127 | - |
dc.identifier.epage | 1134 | - |
dc.identifier.isi | WOS:000270679400019 | - |
dc.identifier.issnl | 1387-2176 | - |