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Conference Paper: Process modeling of projection micro stereo lithography for three-dimensional MEMS
| Title | Process modeling of projection micro stereo lithography for three-dimensional MEMS |
|---|---|
| Authors | |
| Issue Date | 2001 |
| Citation | 2001 ASME International Mechanical Engineering Congress and Exposition, New York, NY, 11-16 November 2001. In ASME International Mechanical Engineering Congress and Exposition, Proceedings, 2001, v. 2, p. 3385-3390 How to Cite? |
| Abstract | We present in this paper a high-resolution projection micro stereo lithography (PμSL) process by using a spatial light modulator as the dynamic mask. This unique technology provides a parallel fabrication of highly complex 3D microstrucrures for MEMS. Based on the understanding of underlying mechanism, the process model has been developed and verified by experiment. The UV doping effect has been examined as it can effectively reduce the curing depth without compromising the chemical property of the resin. Finally, the fabrication of complex 3D microstructures, such as matrix, micro-spring array, with the smallest feature of 10 μm has been reported. |
| Persistent Identifier | http://hdl.handle.net/10722/257297 |
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Sun, Cheng | - |
| dc.contributor.author | Fang, Nicholas | - |
| dc.contributor.author | Zhang, Xiang | - |
| dc.date.accessioned | 2018-07-24T08:59:24Z | - |
| dc.date.available | 2018-07-24T08:59:24Z | - |
| dc.date.issued | 2001 | - |
| dc.identifier.citation | 2001 ASME International Mechanical Engineering Congress and Exposition, New York, NY, 11-16 November 2001. In ASME International Mechanical Engineering Congress and Exposition, Proceedings, 2001, v. 2, p. 3385-3390 | - |
| dc.identifier.uri | http://hdl.handle.net/10722/257297 | - |
| dc.description.abstract | We present in this paper a high-resolution projection micro stereo lithography (PμSL) process by using a spatial light modulator as the dynamic mask. This unique technology provides a parallel fabrication of highly complex 3D microstrucrures for MEMS. Based on the understanding of underlying mechanism, the process model has been developed and verified by experiment. The UV doping effect has been examined as it can effectively reduce the curing depth without compromising the chemical property of the resin. Finally, the fabrication of complex 3D microstructures, such as matrix, micro-spring array, with the smallest feature of 10 μm has been reported. | - |
| dc.language | eng | - |
| dc.relation.ispartof | ASME International Mechanical Engineering Congress and Exposition, Proceedings | - |
| dc.title | Process modeling of projection micro stereo lithography for three-dimensional MEMS | - |
| dc.type | Conference_Paper | - |
| dc.description.nature | link_to_subscribed_fulltext | - |
| dc.identifier.scopus | eid_2-s2.0-1542411446 | - |
| dc.identifier.volume | 2 | - |
| dc.identifier.spage | 3385 | - |
| dc.identifier.epage | 3390 | - |