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Article: Diffusion-limited photopolymerization in scanning micro-stereolithography

TitleDiffusion-limited photopolymerization in scanning micro-stereolithography
Authors
Fang, N.Sun, C.Zhang, X.
Issue Date2004
Citation
Applied Physics A: Materials Science and Processing, 2004, v. 79, n. 8, p. 1839-1842 How to Cite?
DOI: http://dx.doi.org/10.1007/s00339-004-2938-x
AbstractThe trade-off between process speed and resolution in microstereolithography (μSL) roots on the diffusion-limited kinetics of photopolymerization. Using a numerical model, we have investigated the influence of diffusion dominant effect under high photon flux. Radical depletion turned out to limit the smallest feature achievable to the order of 10 μm under high process speed. A solution of pulsed laser curing is proposed in order to realize sub-micron resolution in high speed μSL process.
Persistent Identifierhttp://hdl.handle.net/10722/256998
ISSN
0947-8396
2023 Impact Factor: 2.5
2023 SCImago Journal Rankings: 0.446
ISI Accession Number ID
WOS:000224387200002

 

DC FieldValueLanguage
dc.contributor.authorFang, N.-
dc.contributor.authorSun, C.-
dc.contributor.authorZhang, X.-
dc.date.accessioned2018-07-24T08:58:33Z-
dc.date.available2018-07-24T08:58:33Z-
dc.date.issued2004-
dc.identifier.citationApplied Physics A: Materials Science and Processing, 2004, v. 79, n. 8, p. 1839-1842-
dc.identifier.issn0947-8396-
dc.identifier.urihttp://hdl.handle.net/10722/256998-
dc.description.abstractThe trade-off between process speed and resolution in microstereolithography (μSL) roots on the diffusion-limited kinetics of photopolymerization. Using a numerical model, we have investigated the influence of diffusion dominant effect under high photon flux. Radical depletion turned out to limit the smallest feature achievable to the order of 10 μm under high process speed. A solution of pulsed laser curing is proposed in order to realize sub-micron resolution in high speed μSL process.-
dc.languageeng-
dc.relation.ispartofApplied Physics A: Materials Science and Processing-
dc.titleDiffusion-limited photopolymerization in scanning micro-stereolithography-
dc.typeArticle-
dc.description.naturelink_to_subscribed_fulltext-
dc.identifier.doi10.1007/s00339-004-2938-x-
dc.identifier.scopuseid_2-s2.0-6344256428-
dc.identifier.volume79-
dc.identifier.issue8-
dc.identifier.spage1839-
dc.identifier.epage1842-
dc.identifier.isiWOS:000224387200002-
dc.identifier.issnl0947-8396-

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