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Article: Projecting deep-subwavelength patterns from diffraction-limited masks using metal-dielectric multilayers
Title | Projecting deep-subwavelength patterns from diffraction-limited masks using metal-dielectric multilayers |
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Authors | |
Issue Date | 2008 |
Publisher | American Institute of Physics. The Journal's web site is located at http://apl.aip.org/ |
Citation | Applied Physics Letters, 2008, v. 93 n. 11, article no. 111116 How to Cite? |
Abstract | We utilize a metal-dielectric multilayer structure to generate deep-subwavelength one-dimensional and two-dimensional periodic patterns with diffraction-limited masks. The working wavelength and the pattern are set by the flexible design of the multilayer structure. This scheme is suitable to be applied to deep-subwavelength photolithography. As an example, we numerically demonstrate pattern periods down to 50 nm under 405 nm light illumination. © 2008 American Institute of Physics. |
Persistent Identifier | http://hdl.handle.net/10722/256980 |
ISSN | 2023 Impact Factor: 3.5 2023 SCImago Journal Rankings: 0.976 |
ISI Accession Number ID |
DC Field | Value | Language |
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dc.contributor.author | Xiong, Yi | - |
dc.contributor.author | Liu, Zhaowei | - |
dc.contributor.author | Zhang, Xiang | - |
dc.date.accessioned | 2018-07-24T08:58:30Z | - |
dc.date.available | 2018-07-24T08:58:30Z | - |
dc.date.issued | 2008 | - |
dc.identifier.citation | Applied Physics Letters, 2008, v. 93 n. 11, article no. 111116 | - |
dc.identifier.issn | 0003-6951 | - |
dc.identifier.uri | http://hdl.handle.net/10722/256980 | - |
dc.description.abstract | We utilize a metal-dielectric multilayer structure to generate deep-subwavelength one-dimensional and two-dimensional periodic patterns with diffraction-limited masks. The working wavelength and the pattern are set by the flexible design of the multilayer structure. This scheme is suitable to be applied to deep-subwavelength photolithography. As an example, we numerically demonstrate pattern periods down to 50 nm under 405 nm light illumination. © 2008 American Institute of Physics. | - |
dc.language | eng | - |
dc.publisher | American Institute of Physics. The Journal's web site is located at http://apl.aip.org/ | - |
dc.relation.ispartof | Applied Physics Letters | - |
dc.title | Projecting deep-subwavelength patterns from diffraction-limited masks using metal-dielectric multilayers | - |
dc.type | Article | - |
dc.description.nature | link_to_subscribed_fulltext | - |
dc.identifier.doi | 10.1063/1.2985898 | - |
dc.identifier.scopus | eid_2-s2.0-52349100505 | - |
dc.identifier.volume | 93 | - |
dc.identifier.issue | 11 | - |
dc.identifier.spage | article no. 111116 | - |
dc.identifier.epage | article no. 111116 | - |
dc.identifier.isi | WOS:000259797900016 | - |
dc.identifier.issnl | 0003-6951 | - |