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- Publisher Website: 10.1115/nano2004-46023
- Scopus: eid_2-s2.0-21244445028
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Conference Paper: Plasmonic lithography
Title | Plasmonic lithography |
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Authors | |
Issue Date | 2004 |
Citation | Proceedings of the 3rd ASME Integrated Nanosystems Conference - Design, Synthesis, and Applications, 2004, p. 99-100 How to Cite? |
Abstract | As the next-generation technology moves below 100 nm mark, the need arises for a capability of manipulation and positioning of light on the scale of tens of nanometers. Plasmonic optics opens the door to operate beyond the diffraction limit by placing a sub-wavelength aperture in an opaque metal sheet. Recent experimental works [1] demonstrated that a giant transmission efficiency (>15%) can be achieved by exciting the surface plasmons with artificially displaced arrays of sub-wavelength holes. Moreover the effectively short modal wavelength of surface plasmons opens up the possibility to overcome the diffraction limit in the near-field lithography. This shows promise in a revolutionary high throughput and high density optical lithography. In this paper, we demonstrate the feasibility of near-field nanolithography by exciting surface plasmon on nanostructures perforated on metal film. Plasmonic masks of hole arrays and "bull's eye" structures (single hole surrounded by concentric ring grating) [2] are fabricated using Focused Ion Beam (FIB). A special index matching spacer layer is then deposited onto the masks to ensure high transmissivity. Consequently, an I-line negative photoresist is spun on the top of spacer layer in order to obtain the exposure results. A FDTD simulation study has been conducted to predict the near field profile [3] of the designed plasmonic masks. Our preliminary exposure test using these hole-array masks demonstrated 170 nm period dot array patterns, well beyond the resolution limit of conventional lithography using near-UV wavelength. Furthermore, the exposure result obtained from the bull's eye structures indicated the characteristics of periodicity and polarization dependence, which confirmed the contribution of surface plasmons. Copyright © 2004 by ASME. |
Persistent Identifier | http://hdl.handle.net/10722/256905 |
DC Field | Value | Language |
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dc.contributor.author | Srituravanich, W. | - |
dc.contributor.author | Fang, N. | - |
dc.contributor.author | Sun, C. | - |
dc.contributor.author | Durant, S. | - |
dc.contributor.author | Ambati, M. | - |
dc.contributor.author | Zhang, X. | - |
dc.date.accessioned | 2018-07-24T08:58:17Z | - |
dc.date.available | 2018-07-24T08:58:17Z | - |
dc.date.issued | 2004 | - |
dc.identifier.citation | Proceedings of the 3rd ASME Integrated Nanosystems Conference - Design, Synthesis, and Applications, 2004, p. 99-100 | - |
dc.identifier.uri | http://hdl.handle.net/10722/256905 | - |
dc.description.abstract | As the next-generation technology moves below 100 nm mark, the need arises for a capability of manipulation and positioning of light on the scale of tens of nanometers. Plasmonic optics opens the door to operate beyond the diffraction limit by placing a sub-wavelength aperture in an opaque metal sheet. Recent experimental works [1] demonstrated that a giant transmission efficiency (>15%) can be achieved by exciting the surface plasmons with artificially displaced arrays of sub-wavelength holes. Moreover the effectively short modal wavelength of surface plasmons opens up the possibility to overcome the diffraction limit in the near-field lithography. This shows promise in a revolutionary high throughput and high density optical lithography. In this paper, we demonstrate the feasibility of near-field nanolithography by exciting surface plasmon on nanostructures perforated on metal film. Plasmonic masks of hole arrays and "bull's eye" structures (single hole surrounded by concentric ring grating) [2] are fabricated using Focused Ion Beam (FIB). A special index matching spacer layer is then deposited onto the masks to ensure high transmissivity. Consequently, an I-line negative photoresist is spun on the top of spacer layer in order to obtain the exposure results. A FDTD simulation study has been conducted to predict the near field profile [3] of the designed plasmonic masks. Our preliminary exposure test using these hole-array masks demonstrated 170 nm period dot array patterns, well beyond the resolution limit of conventional lithography using near-UV wavelength. Furthermore, the exposure result obtained from the bull's eye structures indicated the characteristics of periodicity and polarization dependence, which confirmed the contribution of surface plasmons. Copyright © 2004 by ASME. | - |
dc.language | eng | - |
dc.relation.ispartof | Proceedings of the 3rd ASME Integrated Nanosystems Conference - Design, Synthesis, and Applications | - |
dc.title | Plasmonic lithography | - |
dc.type | Conference_Paper | - |
dc.description.nature | link_to_subscribed_fulltext | - |
dc.identifier.doi | 10.1115/nano2004-46023 | - |
dc.identifier.scopus | eid_2-s2.0-21244445028 | - |
dc.identifier.spage | 99 | - |
dc.identifier.epage | 100 | - |