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- Publisher Website: 10.1002/adma.201502322
- Scopus: eid_2-s2.0-84945183543
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Article: Macroscale Transformation Optics Enabled by Photoelectrochemical Etching
| Title | Macroscale Transformation Optics Enabled by Photoelectrochemical Etching |
|---|---|
| Authors | |
| Keywords | transformation optics, photochemical etching porous silicon gradient index optics |
| Issue Date | 2015 |
| Citation | Advanced Materials, 2015, v. 27, n. 40, p. 6131-6136 How to Cite? |
| Abstract | © 2015 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim. Photoelectrochemical etching of silicon can be used to form lateral refractive index gradients for transformation optical devices. This technique allows the fabrication of macroscale devices with large refractive index gradients. Patterned porous layers can also be lifted from the substrate and transferred to other materials, creating more possibilities for novel devices. |
| Persistent Identifier | http://hdl.handle.net/10722/256749 |
| ISSN | 2023 Impact Factor: 27.4 2023 SCImago Journal Rankings: 9.191 |
| ISI Accession Number ID |
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Barth, David S. | - |
| dc.contributor.author | Gladden, Christopher | - |
| dc.contributor.author | Salandrino, Alessandro | - |
| dc.contributor.author | O'Brien, Kevin | - |
| dc.contributor.author | Ye, Ziliang | - |
| dc.contributor.author | Mrejen, Michael | - |
| dc.contributor.author | Wang, Yuan | - |
| dc.contributor.author | Zhang, Xiang | - |
| dc.date.accessioned | 2018-07-24T08:57:48Z | - |
| dc.date.available | 2018-07-24T08:57:48Z | - |
| dc.date.issued | 2015 | - |
| dc.identifier.citation | Advanced Materials, 2015, v. 27, n. 40, p. 6131-6136 | - |
| dc.identifier.issn | 0935-9648 | - |
| dc.identifier.uri | http://hdl.handle.net/10722/256749 | - |
| dc.description.abstract | © 2015 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim. Photoelectrochemical etching of silicon can be used to form lateral refractive index gradients for transformation optical devices. This technique allows the fabrication of macroscale devices with large refractive index gradients. Patterned porous layers can also be lifted from the substrate and transferred to other materials, creating more possibilities for novel devices. | - |
| dc.language | eng | - |
| dc.relation.ispartof | Advanced Materials | - |
| dc.subject | transformation optics, photochemical etching | - |
| dc.subject | porous silicon | - |
| dc.subject | gradient index optics | - |
| dc.title | Macroscale Transformation Optics Enabled by Photoelectrochemical Etching | - |
| dc.type | Article | - |
| dc.description.nature | link_to_subscribed_fulltext | - |
| dc.identifier.doi | 10.1002/adma.201502322 | - |
| dc.identifier.scopus | eid_2-s2.0-84945183543 | - |
| dc.identifier.volume | 27 | - |
| dc.identifier.issue | 40 | - |
| dc.identifier.spage | 6131 | - |
| dc.identifier.epage | 6136 | - |
| dc.identifier.eissn | 1521-4095 | - |
| dc.identifier.isi | WOS:000363476200008 | - |
| dc.identifier.issnl | 0935-9648 | - |