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Conference Paper: Subwavelength nanolithography using surface plasmons

TitleSubwavelength nanolithography using surface plasmons
Authors
Srituravanich, W.Fang, N.Sun, C.Luo, Q.Zhang, X.
KeywordsResists
Plasmons
Optical surface waves
Nanolithography
Aluminum
Lithography
Dielectric materials
Apertures
Surface waves
Surface treatment
Issue Date2003
Citation
Proceedings of the IEEE Conference on Nanotechnology, 2003, v. 2, p. 609-611 How to Cite?
DOI: http://dx.doi.org/10.1109/NANO.2003.1230985
Abstract© 2003 IEEE. We have investigated the novel plasmonic nanolithography by exposing a photoresist layer through a plasmonic mask, which is an opaque metal film with subwavelength hole arrays in it. The hole arrays of various diameters are fabricated by using focused ion beam (FIB). Through the lithography, the hole array patterns are transferred to negative photoresists. As a result, high contrast dot arrays with the smallest diameter of 120 nm, equivalent to ∼λ/3, are observed by atomic force microscope (AFM).
Persistent Identifierhttp://hdl.handle.net/10722/256740
ISSN
1944-9399
2020 SCImago Journal Rankings: 0.120

 

DC FieldValueLanguage
dc.contributor.authorSrituravanich, W.-
dc.contributor.authorFang, N.-
dc.contributor.authorSun, C.-
dc.contributor.authorLuo, Q.-
dc.contributor.authorZhang, X.-
dc.date.accessioned2018-07-24T08:57:46Z-
dc.date.available2018-07-24T08:57:46Z-
dc.date.issued2003-
dc.identifier.citationProceedings of the IEEE Conference on Nanotechnology, 2003, v. 2, p. 609-611-
dc.identifier.issn1944-9399-
dc.identifier.urihttp://hdl.handle.net/10722/256740-
dc.description.abstract© 2003 IEEE. We have investigated the novel plasmonic nanolithography by exposing a photoresist layer through a plasmonic mask, which is an opaque metal film with subwavelength hole arrays in it. The hole arrays of various diameters are fabricated by using focused ion beam (FIB). Through the lithography, the hole array patterns are transferred to negative photoresists. As a result, high contrast dot arrays with the smallest diameter of 120 nm, equivalent to ∼λ/3, are observed by atomic force microscope (AFM).-
dc.languageeng-
dc.relation.ispartofProceedings of the IEEE Conference on Nanotechnology-
dc.subjectResists-
dc.subjectPlasmons-
dc.subjectOptical surface waves-
dc.subjectNanolithography-
dc.subjectAluminum-
dc.subjectLithography-
dc.subjectDielectric materials-
dc.subjectApertures-
dc.subjectSurface waves-
dc.subjectSurface treatment-
dc.titleSubwavelength nanolithography using surface plasmons-
dc.typeConference_Paper-
dc.description.naturelink_to_subscribed_fulltext-
dc.identifier.doi10.1109/NANO.2003.1230985-
dc.identifier.scopuseid_2-s2.0-84943596769-
dc.identifier.volume2-
dc.identifier.spage609-
dc.identifier.epage611-
dc.identifier.eissn1944-9380-

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