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- Publisher Website: 10.1109/TDMR.2017.2702717
- Scopus: eid_2-s2.0-85025810963
- WOS: WOS:000403293000021
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Article: Improved Interfacial and Electrical Properties of GaAs Metal–Oxide–Semiconductor Capacitor by Using Fluorine-Plasma-Treated Interfacial Passivation Layer
| Title | Improved Interfacial and Electrical Properties of GaAs Metal–Oxide–Semiconductor Capacitor by Using Fluorine-Plasma-Treated Interfacial Passivation Layer |
|---|---|
| Authors | |
| Keywords | F-plasma treatment GaAs MOS capacitor Interface-state density Interfacial passivation layer |
| Issue Date | 2017 |
| Citation | IEEE Transactions on Device and Materials Reliability, 2017, v. 17, p. 458-462 How to Cite? |
| Persistent Identifier | http://hdl.handle.net/10722/247442 |
| ISSN | 2023 Impact Factor: 2.5 2023 SCImago Journal Rankings: 0.436 |
| ISI Accession Number ID |
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Lu, HH | - |
| dc.contributor.author | Xu, JP | - |
| dc.contributor.author | Liu, L | - |
| dc.contributor.author | Lai, PT | - |
| dc.contributor.author | Tang, WM | - |
| dc.date.accessioned | 2017-10-18T08:27:19Z | - |
| dc.date.available | 2017-10-18T08:27:19Z | - |
| dc.date.issued | 2017 | - |
| dc.identifier.citation | IEEE Transactions on Device and Materials Reliability, 2017, v. 17, p. 458-462 | - |
| dc.identifier.issn | 1530-4388 | - |
| dc.identifier.uri | http://hdl.handle.net/10722/247442 | - |
| dc.language | eng | - |
| dc.relation.ispartof | IEEE Transactions on Device and Materials Reliability | - |
| dc.subject | F-plasma treatment | - |
| dc.subject | GaAs MOS capacitor | - |
| dc.subject | Interface-state density | - |
| dc.subject | Interfacial passivation layer | - |
| dc.title | Improved Interfacial and Electrical Properties of GaAs Metal–Oxide–Semiconductor Capacitor by Using Fluorine-Plasma-Treated Interfacial Passivation Layer | - |
| dc.type | Article | - |
| dc.identifier.email | Lai, PT: laip@eee.hku.hk | - |
| dc.identifier.authority | Lai, PT=rp00130 | - |
| dc.identifier.doi | 10.1109/TDMR.2017.2702717 | - |
| dc.identifier.scopus | eid_2-s2.0-85025810963 | - |
| dc.identifier.hkuros | 280928 | - |
| dc.identifier.volume | 17 | - |
| dc.identifier.spage | 458 | - |
| dc.identifier.epage | 462 | - |
| dc.identifier.eissn | 1558-2574 | - |
| dc.identifier.isi | WOS:000403293000021 | - |
| dc.identifier.issnl | 1530-4388 | - |
