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- Publisher Website: 10.1109/TED.2016.2618221
- Scopus: eid_2-s2.0-84994300341
- WOS: WOS:000389342200042
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Article: Impact of Nitrogen Incorporation on the Interface Between Ge and La2O3 or Y2O3 Gate Dielectric: A Study on the Formation of Germanate
Title | Impact of Nitrogen Incorporation on the Interface Between Ge and La2O3 or Y2O3 Gate Dielectric: A Study on the Formation of Germanate |
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Authors | |
Keywords | Ge MOS germanate interface quality nitrogen incorporation |
Issue Date | 2016 |
Citation | IEEE Transactions on Electron Devices, 2016, v. 63, p. 4888-4892 How to Cite? |
Persistent Identifier | http://hdl.handle.net/10722/247431 |
ISSN | 2023 Impact Factor: 2.9 2023 SCImago Journal Rankings: 0.785 |
ISI Accession Number ID |
DC Field | Value | Language |
---|---|---|
dc.contributor.author | Cheng, ZX | - |
dc.contributor.author | Liu, L | - |
dc.contributor.author | Xu, JP | - |
dc.contributor.author | Huang, Y | - |
dc.contributor.author | Lai, PT | - |
dc.contributor.author | Tang, WM | - |
dc.date.accessioned | 2017-10-18T08:27:09Z | - |
dc.date.available | 2017-10-18T08:27:09Z | - |
dc.date.issued | 2016 | - |
dc.identifier.citation | IEEE Transactions on Electron Devices, 2016, v. 63, p. 4888-4892 | - |
dc.identifier.issn | 0018-9383 | - |
dc.identifier.uri | http://hdl.handle.net/10722/247431 | - |
dc.language | eng | - |
dc.relation.ispartof | IEEE Transactions on Electron Devices | - |
dc.subject | Ge MOS | - |
dc.subject | germanate | - |
dc.subject | interface quality | - |
dc.subject | nitrogen incorporation | - |
dc.title | Impact of Nitrogen Incorporation on the Interface Between Ge and La2O3 or Y2O3 Gate Dielectric: A Study on the Formation of Germanate | - |
dc.type | Article | - |
dc.identifier.email | Lai, PT: laip@eee.hku.hk | - |
dc.identifier.authority | Lai, PT=rp00130 | - |
dc.identifier.doi | 10.1109/TED.2016.2618221 | - |
dc.identifier.scopus | eid_2-s2.0-84994300341 | - |
dc.identifier.hkuros | 280845 | - |
dc.identifier.volume | 63 | - |
dc.identifier.spage | 4888 | - |
dc.identifier.epage | 4892 | - |
dc.identifier.eissn | 1557-9646 | - |
dc.identifier.isi | WOS:000389342200042 | - |
dc.identifier.issnl | 0018-9383 | - |