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Article: Additive free co-deposition of nanocrystalline copper/cuprous oxide by electrodeposition

TitleAdditive free co-deposition of nanocrystalline copper/cuprous oxide by electrodeposition
Authors
Issue Date2015
PublisherElectrochemical Society, Inc. The Journal's web site is located at http://ojps.aip.org/JES
Citation
Journal of the Electrochemical Society, 2015, v. 162 n. 3, p. D124-D128 How to Cite?
Persistent Identifierhttp://hdl.handle.net/10722/211536
ISSN
2023 Impact Factor: 3.1
2023 SCImago Journal Rankings: 0.868
ISI Accession Number ID

 

DC FieldValueLanguage
dc.contributor.authorNg, SY-
dc.contributor.authorNgan, AHW-
dc.date.accessioned2015-07-16T08:00:46Z-
dc.date.available2015-07-16T08:00:46Z-
dc.date.issued2015-
dc.identifier.citationJournal of the Electrochemical Society, 2015, v. 162 n. 3, p. D124-D128-
dc.identifier.issn0013-4651-
dc.identifier.urihttp://hdl.handle.net/10722/211536-
dc.languageeng-
dc.publisherElectrochemical Society, Inc. The Journal's web site is located at http://ojps.aip.org/JES-
dc.relation.ispartofJournal of the Electrochemical Society-
dc.rightsJournal of the Electrochemical Society. Copyright © Electrochemical Society, Inc.-
dc.rights© The Electrochemical Society, Inc. 2015. All rights reserved. Except as provided under U.S. copyright law, this work may not be reproduced, resold, distributed, or modified without the express permission of The Electrochemical Society (ECS). The archival version of this work was published in Journal of the Electrochemical Society, 2015, v. 162 n. 3, p. D124-D128-
dc.titleAdditive free co-deposition of nanocrystalline copper/cuprous oxide by electrodeposition-
dc.typeArticle-
dc.identifier.emailNgan, AHW: hwngan@hku.hk-
dc.identifier.authorityNgan, AHW=rp00225-
dc.description.naturepostprint-
dc.identifier.doi10.1149/2.0571503jes-
dc.identifier.scopuseid_2-s2.0-84923321053-
dc.identifier.hkuros244357-
dc.identifier.volume162-
dc.identifier.issue3-
dc.identifier.spageD124-
dc.identifier.epageD128-
dc.identifier.isiWOS:000349823700050-
dc.publisher.placeUnited States-
dc.identifier.issnl0013-4651-

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