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Article: Nickel(II) Complexes of N-(dialkylcarbamothioyl)-4-nitrobenzamide as Single-source Precursors for the Deposition of Nanostructured Nickel Sulfide Thin Films by Chemical Vapor Deposition

TitleNickel(II) Complexes of N-(dialkylcarbamothioyl)-4-nitrobenzamide as Single-source Precursors for the Deposition of Nanostructured Nickel Sulfide Thin Films by Chemical Vapor Deposition
Authors
Saeed, SRashid, NMalik, MAO'Brien, PWong, WT
KeywordsAACVD
cis -Configuration
Crystal structure
Nickel complexes
SEM
Thin films
Issue Date2013
Citation
Journal of Coordination Chemistry, 2013, v. 66, p. 2788-2801 How to Cite?
DOI: http://dx.doi.org/10.1080/00958972.2013.807921
Persistent Identifierhttp://hdl.handle.net/10722/205909
ISSN
0095-8972
2023 Impact Factor: 2.2
2023 SCImago Journal Rankings: 0.311
ISI Accession Number ID
WOS:000324365600002

 

DC FieldValueLanguage
dc.contributor.authorSaeed, Sen_US
dc.contributor.authorRashid, Nen_US
dc.contributor.authorMalik, MAen_US
dc.contributor.authorO'Brien, Pen_US
dc.contributor.authorWong, WTen_US
dc.date.accessioned2014-10-20T09:35:41Z-
dc.date.available2014-10-20T09:35:41Z-
dc.date.issued2013en_US
dc.identifier.citationJournal of Coordination Chemistry, 2013, v. 66, p. 2788-2801en_US
dc.identifier.issn0095-8972-
dc.identifier.urihttp://hdl.handle.net/10722/205909-
dc.languageengen_US
dc.relation.ispartofJournal of Coordination Chemistryen_US
dc.subjectAACVD-
dc.subjectcis -Configuration-
dc.subjectCrystal structure-
dc.subjectNickel complexes-
dc.subjectSEM-
dc.subjectThin films-
dc.titleNickel(II) Complexes of N-(dialkylcarbamothioyl)-4-nitrobenzamide as Single-source Precursors for the Deposition of Nanostructured Nickel Sulfide Thin Films by Chemical Vapor Depositionen_US
dc.typeArticleen_US
dc.identifier.emailWong, WT: wtwong@hku.hken_US
dc.identifier.authorityWong, WT=rp00811en_US
dc.identifier.doi10.1080/00958972.2013.807921en_US
dc.identifier.scopuseid_2-s2.0-84884580294-
dc.identifier.hkuros241004en_US
dc.identifier.volume66en_US
dc.identifier.spage2788en_US
dc.identifier.epage2801en_US
dc.identifier.eissn1029-0389-
dc.identifier.isiWOS:000324365600002-
dc.identifier.issnl0095-8972-

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