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- Publisher Website: 10.1002/pssa.201431143
- Scopus: eid_2-s2.0-84927804375
- WOS: WOS:000344461800017
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Article: Chemical composition study of high-K La-silicate gate stacks at sub-nanometer scale
Title | Chemical composition study of high-K La-silicate gate stacks at sub-nanometer scale |
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Authors | |
Keywords | electron energy loss spectroscopy gate stack high-k dielectric La-silicate Z-contrast imaging |
Issue Date | 2014 |
Citation | Physica Status Solidi A, 2014, v. 211 n. 11, p. 2537-2540 How to Cite? |
Persistent Identifier | http://hdl.handle.net/10722/200665 |
ISI Accession Number ID |
DC Field | Value | Language |
---|---|---|
dc.contributor.author | Liu, F | en_US |
dc.contributor.author | YANG, G | en_US |
dc.contributor.author | Duscher, G | en_US |
dc.date.accessioned | 2014-08-21T06:54:17Z | - |
dc.date.available | 2014-08-21T06:54:17Z | - |
dc.date.issued | 2014 | en_US |
dc.identifier.citation | Physica Status Solidi A, 2014, v. 211 n. 11, p. 2537-2540 | en_US |
dc.identifier.uri | http://hdl.handle.net/10722/200665 | - |
dc.language | eng | en_US |
dc.relation.ispartof | Physica Status Solidi A | en_US |
dc.subject | electron energy loss spectroscopy | - |
dc.subject | gate stack | - |
dc.subject | high-k dielectric | - |
dc.subject | La-silicate | - |
dc.subject | Z-contrast imaging | - |
dc.title | Chemical composition study of high-K La-silicate gate stacks at sub-nanometer scale | en_US |
dc.type | Article | en_US |
dc.identifier.email | Liu, F: fordliu@hku.hk | en_US |
dc.identifier.authority | Liu, F=rp01358 | en_US |
dc.identifier.doi | 10.1002/pssa.201431143 | - |
dc.identifier.scopus | eid_2-s2.0-84927804375 | - |
dc.identifier.hkuros | 234294 | en_US |
dc.identifier.spage | 2537 | en_US |
dc.identifier.epage | 2540 | en_US |
dc.identifier.isi | WOS:000344461800017 | - |