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Article: Cascadic multigrid algorithm for robust inverse mask synthesis in optical lithography

TitleCascadic multigrid algorithm for robust inverse mask synthesis in optical lithography
Authors
Lv, WLam, EYMWei, HLiu, S
Keywordsanalytical circle-sampling technique
cascadic multigrid algorithm
edge distance error
optical lithography
robust inverse mask synthesis
Issue Date2014
PublisherS P I E - International Society for Optical Engineering. The Journal's web site is located at http://spie.org/x865.xml
Citation
Journal of Micro/Nanolithography, MEMS, and MOEMS, 2014, v. 13 n. 2, article no. 023003, p. 1-10 How to Cite?
DOI: http://dx.doi.org/10.1117/1.JMM.13.2.023003
Persistent Identifierhttp://hdl.handle.net/10722/200618
ISSN
1932-5150
2023 Impact Factor: 1.5
2023 SCImago Journal Rankings: 0.393
ISI Accession Number ID
WOS:000338635800005

 

DC FieldValueLanguage
dc.contributor.authorLv, Wen_US
dc.contributor.authorLam, EYMen_US
dc.contributor.authorWei, Hen_US
dc.contributor.authorLiu, Sen_US
dc.date.accessioned2014-08-21T06:52:41Z-
dc.date.available2014-08-21T06:52:41Z-
dc.date.issued2014en_US
dc.identifier.citationJournal of Micro/Nanolithography, MEMS, and MOEMS, 2014, v. 13 n. 2, article no. 023003, p. 1-10en_US
dc.identifier.issn1932-5150-
dc.identifier.urihttp://hdl.handle.net/10722/200618-
dc.languageengen_US
dc.publisherS P I E - International Society for Optical Engineering. The Journal's web site is located at http://spie.org/x865.xml-
dc.relation.ispartofJournal of Micro/Nanolithography, MEMS, and MOEMSen_US
dc.rightsThis work is licensed under a Creative Commons Attribution-NonCommercial-NoDerivatives 4.0 International License.-
dc.subjectanalytical circle-sampling technique-
dc.subjectcascadic multigrid algorithm-
dc.subjectedge distance error-
dc.subjectoptical lithography-
dc.subjectrobust inverse mask synthesis-
dc.titleCascadic multigrid algorithm for robust inverse mask synthesis in optical lithographyen_US
dc.typeArticleen_US
dc.identifier.emailLv, W: wenlv@hku.hken_US
dc.identifier.emailLam, EYM: elam@eee.hku.hken_US
dc.identifier.authorityLam, EYM=rp00131en_US
dc.description.naturepublished_or_final_version-
dc.identifier.doi10.1117/1.JMM.13.2.023003-
dc.identifier.scopuseid_2-s2.0-84901265181-
dc.identifier.hkuros233665en_US
dc.identifier.volume13-
dc.identifier.issue2-
dc.identifier.spagearticle no. 023003, p. 1-
dc.identifier.epagearticle no. 023003, p. 10-
dc.identifier.isiWOS:000338635800005-
dc.publisher.placeUnited States-
dc.identifier.issnl1932-5150-

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