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- Publisher Website: 10.1116/1.4758768
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Article: Combined helium ion beam and nanoimprint lithography attains 4 nm half-pitch dense patterns
| Title | Combined helium ion beam and nanoimprint lithography attains 4 nm half-pitch dense patterns |
|---|---|
| Authors | |
| Issue Date | 2012 |
| Publisher | American Vacuum Society. The Journal's web site is located at http://avspublications.org/jvstb/ |
| Citation | Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 2012, v. 30 n. 6, article no. 06F304 How to Cite? |
| Persistent Identifier | http://hdl.handle.net/10722/185964 |
| ISI Accession Number ID |
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Li, W | en_US |
| dc.contributor.author | Wu, W | en_US |
| dc.contributor.author | Williams, RS | en_US |
| dc.date.accessioned | 2013-08-20T11:48:11Z | - |
| dc.date.available | 2013-08-20T11:48:11Z | - |
| dc.date.issued | 2012 | en_US |
| dc.identifier.citation | Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 2012, v. 30 n. 6, article no. 06F304 | en_US |
| dc.identifier.uri | http://hdl.handle.net/10722/185964 | - |
| dc.language | eng | en_US |
| dc.publisher | American Vacuum Society. The Journal's web site is located at http://avspublications.org/jvstb/ | - |
| dc.relation.ispartof | Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures | en_US |
| dc.rights | Copyright 2012 American Vacuum Society. This article may be downloaded for personal use only. Any other use requires prior permission of the author and the American Vacuum Society. The article appeared in Journal of Vacuum Science and Technology: Part B Microelectronics and Nanometer Structures, 2012, v. 30 n. 6, article no. 06F304 and may be found at http://scitation.aip.org.eproxy2.lib.hku.hk/content/avs/journal/jvstb/30/6/10.1116/1.4758768 | - |
| dc.title | Combined helium ion beam and nanoimprint lithography attains 4 nm half-pitch dense patterns | en_US |
| dc.type | Article | en_US |
| dc.identifier.email | Li, W: liwd@hku.hk | en_US |
| dc.identifier.authority | Li, W=rp01581 | en_US |
| dc.description.nature | published_or_final_version | - |
| dc.identifier.doi | 10.1116/1.4758768 | - |
| dc.identifier.scopus | eid_2-s2.0-84870345529 | - |
| dc.identifier.hkuros | 220426 | en_US |
| dc.identifier.volume | 30 | en_US |
| dc.identifier.spage | 06F304 | en_US |
| dc.identifier.epage | 06F304 | en_US |
| dc.identifier.isi | WOS:000311667300009 | - |