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- Publisher Website: 10.1364/OE.21.008076
- Scopus: eid_2-s2.0-84875976065
- PMID: 23571898
- WOS: WOS:000317659300024
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Article: Efficient source and mask optimization with augmented Lagrangian methods in optical lithography
Title | Efficient source and mask optimization with augmented Lagrangian methods in optical lithography |
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Authors | |
Issue Date | 2013 |
Citation | Optics Express, 2013, v. 21, p. 8076-8090 How to Cite? |
Persistent Identifier | http://hdl.handle.net/10722/185912 |
ISI Accession Number ID |
DC Field | Value | Language |
---|---|---|
dc.contributor.author | LI, J | en_US |
dc.contributor.author | Liu, S | en_US |
dc.contributor.author | Lam, EYM | en_US |
dc.date.accessioned | 2013-08-20T11:44:24Z | - |
dc.date.available | 2013-08-20T11:44:24Z | - |
dc.date.issued | 2013 | en_US |
dc.identifier.citation | Optics Express, 2013, v. 21, p. 8076-8090 | en_US |
dc.identifier.uri | http://hdl.handle.net/10722/185912 | - |
dc.language | eng | en_US |
dc.relation.ispartof | Optics Express | en_US |
dc.title | Efficient source and mask optimization with augmented Lagrangian methods in optical lithography | en_US |
dc.type | Article | en_US |
dc.identifier.email | Lam, EYM: elam@eee.hku.hk | en_US |
dc.identifier.authority | Lam, EYM=rp00131 | en_US |
dc.identifier.doi | 10.1364/OE.21.008076 | - |
dc.identifier.pmid | 23571898 | - |
dc.identifier.scopus | eid_2-s2.0-84875976065 | - |
dc.identifier.hkuros | 220482 | en_US |
dc.identifier.volume | 21 | en_US |
dc.identifier.spage | 8076 | en_US |
dc.identifier.epage | 8090 | en_US |
dc.identifier.eissn | 1094-4087 | - |
dc.identifier.isi | WOS:000317659300024 | - |
dc.identifier.issnl | 1094-4087 | - |