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Article: Effect of annealing temperature on microstructure and magnetism of FePt/TaOx bilayer

TitleEffect of annealing temperature on microstructure and magnetism of FePt/TaOx bilayer
Authors
Li, GJLeung, CWChen, YCLin, KWSun, ACHsu, JHPong, PWT
KeywordsAnnealing temperature
Coercivity
FePt
Issue Date2013
PublisherElsevier BV. The Journal's web site is located at http://www.elsevier.com/locate/mee
Citation
Microelectronic Engineering, 2013, v. 110, p. 241-245 How to Cite?
DOI: http://dx.doi.org/10.1016/j.mee.2013.01.028
Persistent Identifierhttp://hdl.handle.net/10722/185877
ISSN
0167-9317
2023 Impact Factor: 2.6
2023 SCImago Journal Rankings: 0.503
ISI Accession Number ID
WOS:000326003600047

 

DC FieldValueLanguage
dc.contributor.authorLi, GJen_US
dc.contributor.authorLeung, CWen_US
dc.contributor.authorChen, YCen_US
dc.contributor.authorLin, KWen_US
dc.contributor.authorSun, ACen_US
dc.contributor.authorHsu, JHen_US
dc.contributor.authorPong, PWTen_US
dc.date.accessioned2013-08-20T11:44:10Z-
dc.date.available2013-08-20T11:44:10Z-
dc.date.issued2013-
dc.identifier.citationMicroelectronic Engineering, 2013, v. 110, p. 241-245en_US
dc.identifier.issn0167-9317-
dc.identifier.urihttp://hdl.handle.net/10722/185877-
dc.languageengen_US
dc.publisherElsevier BV. The Journal's web site is located at http://www.elsevier.com/locate/mee-
dc.relation.ispartofMicroelectronic Engineeringen_US
dc.subjectAnnealing temperature-
dc.subjectCoercivity-
dc.subjectFePt-
dc.titleEffect of annealing temperature on microstructure and magnetism of FePt/TaOx bilayeren_US
dc.typeArticleen_US
dc.identifier.emailPong, PWT: ppong@eee.hku.hken_US
dc.identifier.authorityPong, PWT=rp00217en_US
dc.identifier.doi10.1016/j.mee.2013.01.028-
dc.identifier.scopuseid_2-s2.0-84885172861-
dc.identifier.hkuros219717en_US
dc.identifier.hkuros227863-
dc.identifier.volume110-
dc.identifier.spage241-
dc.identifier.epage245-
dc.identifier.isiWOS:000326003600047-
dc.publisher.placeNetherlands-
dc.identifier.issnl0167-9317-

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