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Article: Nanoimprint lithography with ≤60 nm overlay precision
Title | Nanoimprint lithography with ≤60 nm overlay precision |
---|---|
Authors | |
Keywords | Lithography Nanoimprint Overlay |
Issue Date | 2012 |
Publisher | Hewlett Packard Development Company, L.P. The Publication's web site is located at https://hplabs.itcs.hp.com/techreports/2012/HPL-2012-6.html |
Citation | Hp Laboratories Technical Report, 2012, article no. HPL-2012-6 How to Cite? |
Abstract | Nanoimprint lithography (NIL) is a high-resolution, high-throughput and cost-effective nano-patterning technology. However, the overlay accuracy is lagging behind the resolution because of the high cost of mechanical precision. We have built an inexpensive stand-alone machine based on the wafer bowing nanoimprint process, and demonstrated single-point overlay of two transferred pattern layers with an accuracy of ≤60 nm. © Copyright 2011 Hewlett-Packard Development Company, L.P. |
Persistent Identifier | http://hdl.handle.net/10722/157167 |
References |
DC Field | Value | Language |
---|---|---|
dc.contributor.author | Wu, W | en_US |
dc.contributor.author | Walmsley, RG | en_US |
dc.contributor.author | Li, WD | en_US |
dc.contributor.author | Li, X | en_US |
dc.contributor.author | Williams, RS | en_US |
dc.date.accessioned | 2012-08-08T08:45:37Z | - |
dc.date.available | 2012-08-08T08:45:37Z | - |
dc.date.issued | 2012 | en_US |
dc.identifier.citation | Hp Laboratories Technical Report, 2012, article no. HPL-2012-6 | en_US |
dc.identifier.uri | http://hdl.handle.net/10722/157167 | - |
dc.description.abstract | Nanoimprint lithography (NIL) is a high-resolution, high-throughput and cost-effective nano-patterning technology. However, the overlay accuracy is lagging behind the resolution because of the high cost of mechanical precision. We have built an inexpensive stand-alone machine based on the wafer bowing nanoimprint process, and demonstrated single-point overlay of two transferred pattern layers with an accuracy of ≤60 nm. © Copyright 2011 Hewlett-Packard Development Company, L.P. | en_US |
dc.language | eng | en_US |
dc.publisher | Hewlett Packard Development Company, L.P. The Publication's web site is located at https://hplabs.itcs.hp.com/techreports/2012/HPL-2012-6.html | - |
dc.relation.ispartof | HP Laboratories Technical Report | en_US |
dc.subject | Lithography | en_US |
dc.subject | Nanoimprint | en_US |
dc.subject | Overlay | en_US |
dc.title | Nanoimprint lithography with ≤60 nm overlay precision | en_US |
dc.type | Article | en_US |
dc.identifier.email | Li, WD:liwd@hku.hk | en_US |
dc.identifier.authority | Li, WD=rp01581 | en_US |
dc.description.nature | link_to_OA_fulltext | en_US |
dc.identifier.scopus | eid_2-s2.0-84862946450 | en_US |
dc.relation.references | http://www.scopus.com/mlt/select.url?eid=2-s2.0-84855644171&selection=ref&src=s&origin=recordpage | en_US |
dc.identifier.issue | 6 | en_US |
dc.identifier.scopusauthorid | Wu, W=7407081009 | en_US |
dc.identifier.scopusauthorid | Walmsley, RG=7005133542 | en_US |
dc.identifier.scopusauthorid | Li, WD=35181575900 | en_US |
dc.identifier.scopusauthorid | Li, X=7501699789 | en_US |
dc.identifier.scopusauthorid | Williams, RS=7409606427 | en_US |