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Article: Hydrothermal treatment of ZnO nanostructures

TitleHydrothermal treatment of ZnO nanostructures
Authors
Chen, XNg, AMCDjurišić, ABLing, CCChan, WK
KeywordsHydrothermal treatments
Morphology
N-nanorods
Oxides
Photoluminsescence
Scanning electron microscopy
Zinc oxide
Issue Date2012
PublisherElsevier S.A.. The Journal's web site is located at http://www.elsevier.com/locate/tsf
Citation
Thin Solid Films, 2012, v. 520 n. 7, p. 2656-2662 How to Cite?
DOI: http://dx.doi.org/10.1016/j.tsf.2011.11.019
AbstractHydrothermal treatment of ZnO nanostructures involves low temperatures (150-200 °C) and elevated water vapor pressure for the purpose of the improvement in the material properties. Under such moderate conditions, no significant changes in the morphology would be expected. Nevertheless, such treatment results in a significant change of nanostructured morphologies of ZnO. The observed changes are dependent on the starting material properties and the substrate used for the growth. In the case of Si substrate, hydrothermal treatment results in significant Si contamination of the samples. In terms of the optical properties, improvements are observed only in some cases, while samples with excellent starting optical properties are degraded by the treatment. Mechanisms responsible for the observed changes are discussed. © 2011 Elsevier B.V. All rights reserved.
Persistent Identifierhttp://hdl.handle.net/10722/145552
ISSN
0040-6090
2023 Impact Factor: 2.0
2023 SCImago Journal Rankings: 0.400
ISI Accession Number ID
WOS:000301085100046
Funding AgencyGrant Number
project RGC CRFCityU6/CRF/08
Strategic Research Theme, University Development Fund
University of Hong Kong
Funding Information:

Financial support from the project RGC CRF CityU6/CRF/08 and the Strategic Research Theme, University Development Fund, and Small Project Funding of the University of Hong Kong is acknowledged.

References
References in Scopus
Grants
Studies of Fundamental Properties of Nanosurfaces and Selected Applications
Studies of Fundamental Properties of Nanosurfaces and Selected Applications

 

DC FieldValueLanguage
dc.contributor.authorChen, Xen_HK
dc.contributor.authorNg, AMCen_HK
dc.contributor.authorDjurišić, ABen_HK
dc.contributor.authorLing, CCen_HK
dc.contributor.authorChan, WKen_HK
dc.date.accessioned2012-02-28T01:53:45Z-
dc.date.available2012-02-28T01:53:45Z-
dc.date.issued2012en_HK
dc.identifier.citationThin Solid Films, 2012, v. 520 n. 7, p. 2656-2662en_HK
dc.identifier.issn0040-6090en_HK
dc.identifier.urihttp://hdl.handle.net/10722/145552-
dc.description.abstractHydrothermal treatment of ZnO nanostructures involves low temperatures (150-200 °C) and elevated water vapor pressure for the purpose of the improvement in the material properties. Under such moderate conditions, no significant changes in the morphology would be expected. Nevertheless, such treatment results in a significant change of nanostructured morphologies of ZnO. The observed changes are dependent on the starting material properties and the substrate used for the growth. In the case of Si substrate, hydrothermal treatment results in significant Si contamination of the samples. In terms of the optical properties, improvements are observed only in some cases, while samples with excellent starting optical properties are degraded by the treatment. Mechanisms responsible for the observed changes are discussed. © 2011 Elsevier B.V. All rights reserved.en_HK
dc.languageengen_US
dc.publisherElsevier S.A.. The Journal's web site is located at http://www.elsevier.com/locate/tsfen_HK
dc.relation.ispartofThin Solid Filmsen_HK
dc.subjectHydrothermal treatmentsen_HK
dc.subjectMorphologyen_HK
dc.subjectN-nanorodsen_HK
dc.subjectOxidesen_HK
dc.subjectPhotoluminsescenceen_HK
dc.subjectScanning electron microscopyen_HK
dc.subjectZinc oxideen_HK
dc.titleHydrothermal treatment of ZnO nanostructuresen_HK
dc.typeArticleen_HK
dc.identifier.emailDjurišić, AB: dalek@hku.hken_HK
dc.identifier.emailLing, CC: ccling@hkucc.hku.hken_HK
dc.identifier.emailChan, WK: waichan@hku.hken_HK
dc.identifier.authorityDjurišić, AB=rp00690en_HK
dc.identifier.authorityLing, CC=rp00747en_HK
dc.identifier.authorityChan, WK=rp00667en_HK
dc.description.naturelink_to_subscribed_fulltext-
dc.identifier.doi10.1016/j.tsf.2011.11.019en_HK
dc.identifier.scopuseid_2-s2.0-84856407492en_HK
dc.identifier.hkuros198631en_US
dc.relation.referenceshttp://www.scopus.com/mlt/select.url?eid=2-s2.0-84856407492&selection=ref&src=s&origin=recordpageen_HK
dc.identifier.volume520en_HK
dc.identifier.issue7en_HK
dc.identifier.spage2656en_HK
dc.identifier.epage2662en_HK
dc.identifier.isiWOS:000301085100046-
dc.publisher.placeSwitzerlanden_HK
dc.relation.projectStudies of Fundamental Properties of Nanosurfaces and Selected Applications-
dc.relation.projectStudies of Fundamental Properties of Nanosurfaces and Selected Applications-
dc.identifier.scopusauthoridChen, X=35274291400en_HK
dc.identifier.scopusauthoridNg, AMC=12140078600en_HK
dc.identifier.scopusauthoridDjurišić, AB=7004904830en_HK
dc.identifier.scopusauthoridLing, CC=13310239300en_HK
dc.identifier.scopusauthoridChan, WK=13310083000en_HK
dc.identifier.citeulike10055207-
dc.identifier.issnl0040-6090-

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