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Conference Paper: Effects of electro- Fenton process on blood compatibility and nickel suppression of NiTi shape memory alloy
Title | Effects of electro- Fenton process on blood compatibility and nickel suppression of NiTi shape memory alloy |
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Authors | |
Keywords | Blood compatibility Electro-Fenton process Nickel suppression NiTi shape memory alloy |
Issue Date | 2008 |
Publisher | Trans Tech Publications Ltd.. The Journal's web site is located at http://www.scitec.ch/1022-6680/ |
Citation | The 2008 International Conference on Multifunctional Materials and Structures; Hong Kong, China; 28-31 July 2008. In Advanced Materials Research, 2008, v. 47-50 pt. 1, p. 314-317 How to Cite? |
Abstract | Electro-Fenton process as a modified Fenton's oxidation method in waster water treatment can provide a stable hydroxyl radical (·OH) source by continuous reaction of electrochemically generated H2O2 with Fe2+ ions for surface oxidation modification of NiTi shape memory alloy (SMA). In this work, effects of electro-Fenton process on blood compatibility and nickel suppression of NiTi SMA were investigated by SEM and XPS, inductively-coupled plasma mass spectrometry (ICPMS), hemolysis analysis and blood platelet adhesion test. It is found that electro-Fenton process is a notably effective way to impede out-diffusion of Ni from NiTi SMA in simulated body fluids during the entire ten week immersion period. It can also improve the hemolysis resistance and thromboresistance of biomedical NiTi SMA. The improvement of blood compatibility and nickel suppression of NiTi SMA can be attributed to the formation of surface titania film with a Ni-free zone near its top surface by electro-Fenton process. © 2008 Trans Tech Publications. |
Persistent Identifier | http://hdl.handle.net/10722/139538 |
ISSN | |
References |
DC Field | Value | Language |
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dc.contributor.author | Chu, CL | en_HK |
dc.contributor.author | Hu, T | en_HK |
dc.contributor.author | Wu, SL | en_HK |
dc.contributor.author | Pu, YP | en_HK |
dc.contributor.author | Chung, CY | en_HK |
dc.contributor.author | Yeung, KWK | en_HK |
dc.contributor.author | Chu, PK | en_HK |
dc.date.accessioned | 2011-09-23T05:51:23Z | - |
dc.date.available | 2011-09-23T05:51:23Z | - |
dc.date.issued | 2008 | en_HK |
dc.identifier.citation | The 2008 International Conference on Multifunctional Materials and Structures; Hong Kong, China; 28-31 July 2008. In Advanced Materials Research, 2008, v. 47-50 pt. 1, p. 314-317 | en_US |
dc.identifier.issn | 1022-6680 | en_HK |
dc.identifier.uri | http://hdl.handle.net/10722/139538 | - |
dc.description.abstract | Electro-Fenton process as a modified Fenton's oxidation method in waster water treatment can provide a stable hydroxyl radical (·OH) source by continuous reaction of electrochemically generated H2O2 with Fe2+ ions for surface oxidation modification of NiTi shape memory alloy (SMA). In this work, effects of electro-Fenton process on blood compatibility and nickel suppression of NiTi SMA were investigated by SEM and XPS, inductively-coupled plasma mass spectrometry (ICPMS), hemolysis analysis and blood platelet adhesion test. It is found that electro-Fenton process is a notably effective way to impede out-diffusion of Ni from NiTi SMA in simulated body fluids during the entire ten week immersion period. It can also improve the hemolysis resistance and thromboresistance of biomedical NiTi SMA. The improvement of blood compatibility and nickel suppression of NiTi SMA can be attributed to the formation of surface titania film with a Ni-free zone near its top surface by electro-Fenton process. © 2008 Trans Tech Publications. | en_HK |
dc.language | eng | en_US |
dc.publisher | Trans Tech Publications Ltd.. The Journal's web site is located at http://www.scitec.ch/1022-6680/ | en_HK |
dc.relation.ispartof | Advanced Materials Research | en_HK |
dc.subject | Blood compatibility | en_HK |
dc.subject | Electro-Fenton process | en_HK |
dc.subject | Nickel suppression | en_HK |
dc.subject | NiTi shape memory alloy | en_HK |
dc.title | Effects of electro- Fenton process on blood compatibility and nickel suppression of NiTi shape memory alloy | en_HK |
dc.type | Conference_Paper | en_HK |
dc.identifier.email | Yeung, KWK:wkkyeung@hkucc.hku.hk | en_HK |
dc.identifier.authority | Yeung, KWK=rp00309 | en_HK |
dc.description.nature | link_to_subscribed_fulltext | - |
dc.identifier.doi | 10.4028/www.scientific.net/AMR.47-50.314 | - |
dc.identifier.scopus | eid_2-s2.0-56349130588 | en_HK |
dc.identifier.hkuros | 192168 | en_US |
dc.relation.references | http://www.scopus.com/mlt/select.url?eid=2-s2.0-56349130588&selection=ref&src=s&origin=recordpage | en_HK |
dc.identifier.volume | 47-50 pt. 1 | en_HK |
dc.identifier.spage | 314 | en_HK |
dc.identifier.epage | 317 | en_HK |
dc.publisher.place | Switzerland | en_HK |
dc.identifier.scopusauthorid | Chu, CL=7404345713 | en_HK |
dc.identifier.scopusauthorid | Hu, T=25948400300 | en_HK |
dc.identifier.scopusauthorid | Wu, SL=15125218800 | en_HK |
dc.identifier.scopusauthorid | Pu, YP=7103191509 | en_HK |
dc.identifier.scopusauthorid | Chung, CY=8100842800 | en_HK |
dc.identifier.scopusauthorid | Yeung, KWK=13309584700 | en_HK |
dc.identifier.scopusauthorid | Chu, PK=36040705700 | en_HK |
dc.customcontrol.immutable | sml 170331 amended | - |
dc.identifier.issnl | 1022-6680 | - |