Showing results 1 to 3 of 3
Title | Author(s) | Issue Date | |
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Enhanced reliability for low-temperature gate dielectric of MOS devices by N2O or NO plasma nitridation Journal:Microelectronics Reliability | 2003 | ||
Improved reliability for gate dielectric of low-temperature polysilicon thin-film transistors by NO-plasma nitridation Journal:Solid-State Electronics | 2003 | ||
Optimization of plasma nitridation for reliability enhancement of low-temperature gate dielectric in MOS devices Journal:Solid-State Electronics | 2003 |