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Conference Paper: Photosensitivity and light emitting properties of some ruthenium cntaining poly(phenylene vinylene) with enhanced electron drift mobility
Title | Photosensitivity and light emitting properties of some ruthenium cntaining poly(phenylene vinylene) with enhanced electron drift mobility |
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Authors | |
Issue Date | 2000 |
Citation | World Polymer Congress - IUPAC MACRO 2000, 38th Macromolecular IUPAC Symposium, Warsaw, Poland, 9-14 July 2000 How to Cite? |
Persistent Identifier | http://hdl.handle.net/10722/96804 |
DC Field | Value | Language |
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dc.contributor.author | Ng, PK | en_HK |
dc.contributor.author | Gong, X | en_HK |
dc.contributor.author | Chan, WK | en_HK |
dc.date.accessioned | 2010-09-25T16:45:37Z | - |
dc.date.available | 2010-09-25T16:45:37Z | - |
dc.date.issued | 2000 | en_HK |
dc.identifier.citation | World Polymer Congress - IUPAC MACRO 2000, 38th Macromolecular IUPAC Symposium, Warsaw, Poland, 9-14 July 2000 | - |
dc.identifier.uri | http://hdl.handle.net/10722/96804 | - |
dc.language | eng | en_HK |
dc.relation.ispartof | World Polymer Congress | en_HK |
dc.title | Photosensitivity and light emitting properties of some ruthenium cntaining poly(phenylene vinylene) with enhanced electron drift mobility | en_HK |
dc.type | Conference_Paper | en_HK |
dc.identifier.email | Chan, WK: waichan@hku.hk | en_HK |
dc.identifier.authority | Chan, WK=rp00667 | en_HK |
dc.identifier.hkuros | 58762 | en_HK |