Conference Paper: Formation of CAP04 and suppression of Ni leaching in nitinol using oxygen and sodium plasma immersion ion implantation

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TitleFormation of CAP04 and suppression of Ni leaching in nitinol using oxygen and sodium plasma immersion ion implantation
AuthorsYeung, KWK
Chan, YL
Lu, WW
Luk, KDK
Chan, D
Wu, SL
Liu, XM
Chu, CL
Chung, CY
Chu, PK
Cheung, KMC
Chung, CY
Issue Date2008
DescriptionSICOT/SIROT 2008 XXIV Triennial World Congress, Hong Kong, August 24-28, 2008
DC Field
Value
dc.contributor.authorYeung, KWK
dc.contributor.authorChan, YL
dc.contributor.authorLu, WW
dc.contributor.authorLuk, KDK
dc.contributor.authorChan, D
dc.contributor.authorWu, SL
dc.contributor.authorLiu, XM
dc.contributor.authorChu, CL
dc.contributor.authorChung, CY
dc.contributor.authorChu, PK
dc.contributor.authorCheung, KMC
dc.contributor.authorChung, CY
dc.date.accessioned2010-07-13T03:42:35Z
dc.date.available2010-07-13T03:42:35Z
dc.date.issued2008
dc.descriptionSICOT/SIROT 2008 XXIV Triennial World Congress, Hong Kong, August 24-28, 2008
dc.identifier.hkuros166125
dc.identifier.urihttp://hdl.handle.net/10722/61568
dc.languageeng
dc.titleFormation of CAP04 and suppression of Ni leaching in nitinol using oxygen and sodium plasma immersion ion implantation
dc.typeConference_Paper