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Conference Paper: NADH oxidation at fluorosurfactant-covered metal electrodes

TitleNADH oxidation at fluorosurfactant-covered metal electrodes
Authors
Issue Date2004
PublisherElectrochemical Society, Inc.
Citation
The 206th Meeting of The Electrochemical Society (ECS) and the 2004 Fall Meeting of The Electrochemical Society of Japan (ECSJ) Honolulu, Hawaii, 3-8 October 2004 How to Cite?
DescriptionAbstract no. 2209
Persistent Identifierhttp://hdl.handle.net/10722/54013
ISSN

 

DC FieldValueLanguage
dc.contributor.authorZu, Yen_HK
dc.contributor.authorLi, Fen_HK
dc.date.accessioned2009-04-03T07:34:26Z-
dc.date.available2009-04-03T07:34:26Z-
dc.date.issued2004en_HK
dc.identifier.citationThe 206th Meeting of The Electrochemical Society (ECS) and the 2004 Fall Meeting of The Electrochemical Society of Japan (ECSJ) Honolulu, Hawaii, 3-8 October 2004en_HK
dc.identifier.issn0161-6374en_HK
dc.identifier.urihttp://hdl.handle.net/10722/54013-
dc.descriptionAbstract no. 2209en_HK
dc.languageengen_HK
dc.publisherElectrochemical Society, Inc.en_HK
dc.rightsProceedings of Electrochemical Society. Copyright © Electrochemical Society, Inc.en_HK
dc.rightsCreative Commons: Attribution 3.0 Hong Kong License-
dc.rights© The Electrochemical Society, Inc. 2004. All rights reserved. Except as provided under U.S. copyright law, this work may not be reproduced, resold, distributed, or modified without the express permission of The Electrochemical Society (ECS). The archival version of this work was published in [insert bibliographic information hereen_HK
dc.titleNADH oxidation at fluorosurfactant-covered metal electrodesen_HK
dc.typeConference_Paperen_HK
dc.identifier.openurlhttp://library.hku.hk:4550/resserv?sid=HKU:IR&issn=0161-6374&volume=&spage=&epage=&date=2004&atitle=NADH+oxidation+at+fluorosurfactant-covered+metal+electrodes+en_HK
dc.identifier.emailZu, Y: ybzu@yahoo.comen_HK
dc.description.naturepublished_or_final_versionen_HK
dc.identifier.hkuros106355-

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