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  Patent History
  • Application
    US 09/336445 1999-06-21
  • Granted
    US 6327033 2001-12-04
  Patent Family

granted patent: Detection Of Phase Defects On Photomasks By Differential Imaging

TitleDetection Of Phase Defects On Photomasks By Differential Imaging
Granted PatentUS 6327033
Granted Date2001-12-04
Priority Date1999-06-21 US 09/336445
Inventors
Issue Date2001
Citation
US Patent 6327033. Washington, DC: US Patent and Trademark Office (USPTO), 2001 How to Cite?
AbstractA Method For Detecting Phase Features Or Phase Defects On Photomasks For Optical Lithography Is Described. The Asymmetric Imaging Behavior Through Focus Of Defects Or Features With A Phase Other Than 0 Deg Or 180 Deg Is Used To Distinguish Them From Other Features On The Mask. The Mask Is Inspected At Equally Spaced Positions About An Optimum Focus In Both Positive And Negative Directions. The Images Are Subtracted From One Another To Produce A Differential Image Of The Mask. While Opaque Features As Well As Transmitting Features At 0 Deg And 180 Deg Behave Identically At Positive And Negative Defocus, Thus Leading To A Zero-Valued Differential Image, The Focus Asymmetry Of Phase Defects And Features Produces A Non-Zero Differential Image From Which These Phase Defects And Features Can Be Located. By Comparing The Locations On The Mask For Which A Non-Zero Differential Image Is Obtained With The Designed Data For The Mask, The Phase Defects Can Be Sorted From The Phase Features And The Absence Of Phase Features Can Be Detected. Additional Image Processing Can Be Applied To Verify The Integrity Of The Phase Features. The Differential Image Inspection Technique Can Be Implemented On Existing Optical Inspection Tools By Employing A Two-Pass Inspection Performed At Positive And Negative Defocus In Sequence. In Addition, A New Apparatus With Parallel Inspection Optics Is Described For Inspecting The Mask At Positive And Negative Focus Simultaneously.
Persistent Identifierhttp://hdl.handle.net/10722/46533
References

 

DC FieldValueLanguage
dc.date.accessioned2007-10-30T06:52:13Z-
dc.date.available2007-10-30T06:52:13Z-
dc.date.issued2001-
dc.identifier.citationUS Patent 6327033. Washington, DC: US Patent and Trademark Office (USPTO), 2001en_HK
dc.identifier.urihttp://hdl.handle.net/10722/46533-
dc.description.abstractA Method For Detecting Phase Features Or Phase Defects On Photomasks For Optical Lithography Is Described. The Asymmetric Imaging Behavior Through Focus Of Defects Or Features With A Phase Other Than 0 Deg Or 180 Deg Is Used To Distinguish Them From Other Features On The Mask. The Mask Is Inspected At Equally Spaced Positions About An Optimum Focus In Both Positive And Negative Directions. The Images Are Subtracted From One Another To Produce A Differential Image Of The Mask. While Opaque Features As Well As Transmitting Features At 0 Deg And 180 Deg Behave Identically At Positive And Negative Defocus, Thus Leading To A Zero-Valued Differential Image, The Focus Asymmetry Of Phase Defects And Features Produces A Non-Zero Differential Image From Which These Phase Defects And Features Can Be Located. By Comparing The Locations On The Mask For Which A Non-Zero Differential Image Is Obtained With The Designed Data For The Mask, The Phase Defects Can Be Sorted From The Phase Features And The Absence Of Phase Features Can Be Detected. Additional Image Processing Can Be Applied To Verify The Integrity Of The Phase Features. The Differential Image Inspection Technique Can Be Implemented On Existing Optical Inspection Tools By Employing A Two-Pass Inspection Performed At Positive And Negative Defocus In Sequence. In Addition, A New Apparatus With Parallel Inspection Optics Is Described For Inspecting The Mask At Positive And Negative Focus Simultaneously.en_HK
dc.format.extent2095326 bytes-
dc.format.extent5278 bytes-
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dc.languageengen_HK
dc.relation.isreferencedbyUS 2010226562 (A1) 2010-09-09en_HK
dc.relation.isreferencedbyUS 8111900 (B2) 2012-02-07en_HK
dc.relation.isreferencedbyWO 2005026706 (A1) 2005-03-24en_HK
dc.relation.isreferencedbyUS 6879406 (B1) 2005-04-12en_HK
dc.relation.isreferencedbyWO 2004027830 (A2) 2004-04-01en_HK
dc.relation.isreferencedbyWO 2004027830 (A3) 2004-05-06en_HK
dc.relation.isreferencedbyUS 2004223145 (A1) 2004-11-11en_HK
dc.relation.isreferencedbyUS 7016027 (B2) 2006-03-21en_HK
dc.relation.isreferencedbyWO 03058681 (A2) 2003-07-17en_HK
dc.relation.isreferencedbyWO 03058681 (A3) 2003-08-28en_HK
dc.relation.isreferencedbyUS 2004105577 (A1) 2004-06-03en_HK
dc.relation.isreferencedbyUS 7171034 (B2) 2007-01-30en_HK
dc.relation.isreferencedbyUS 6994939 (B1) 2006-02-07en_HK
dc.relation.isreferencedbyUS 7027635 (B1) 2006-04-11en_HK
dc.relation.isreferencedbyUS 2002186879 (A1) 2002-12-12en_HK
dc.relation.isreferencedbyUS 7072502 (B2) 2006-07-04en_HK
dc.relation.isreferencedbyUS 2001019625 (A1) 2001-09-06en_HK
dc.relation.isreferencedbyUS 7133548 (B2) 2006-11-07en_HK
dc.relation.isreferencedbyUS 6704695 (B1) 2004-03-09en_HK
dc.rightsCreative Commons: Attribution 3.0 Hong Kong License For Public Patent Documents-
dc.titleDetection Of Phase Defects On Photomasks By Differential Imagingen_HK
dc.typePatenten_HK
dc.description.naturepublished_or_final_version-
dc.contributor.inventorFerguson, RAen_HK
dc.contributor.inventorWong, AKKen_HK
patents.identifier.applicationUS 09/336445en_HK
patents.identifier.grantedUS 6327033en_HK
patents.description.assigneeIbm [Us]en_HK
patents.description.countryUnited States of Americaen_HK
patents.date.granted2001-12-04en_HK
dc.relation.referencesUS 5270796 (A) 1993-12-14en_HK
dc.relation.referencesUS 5353116 (A) 1994-10-04en_HK
dc.relation.referencesUS 5786112 (A) 1998-07-28en_HK
patents.date.application1999-06-21en_HK
patents.date.priority1999-06-21 US 09/336445en_HK
patents.description.ccUSen_HK
patents.relation.familyUS 6327033 (B1) 2001-12-04en_HK
patents.description.kindB1en_HK
patents.typePatent_granteden_HK

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