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Article: An in situ transmission electron microscope investigation into grain growth and ordering of sputter-deposited nanocrystalline Ni3Al thin films

TitleAn in situ transmission electron microscope investigation into grain growth and ordering of sputter-deposited nanocrystalline Ni3Al thin films
Authors
KeywordsEngineering
Engineering mechanics and materials physics
Issue Date2002
PublisherMaterials Research Society. The Journal's web site is located at http://www.mrs.org/publications/jmr
Citation
Journal Of Materials Research, 2002, v. 17 n. 8, p. 2085-2094 How to Cite?
AbstractThe grain growth kinetics and ordering behavior of direct-current magnetron sputter-deposited Ni75at.%Al25at.% alloy films were investigated using in situ isothermal annealing in a transmission electron microscope. Both normal and abnormal grain growth modes were observed. The normal grain growth kinetics under isothermal heating from 300 to 700°C were found to comply with the Burke law d = K/dn-1, where d is grain size and K and n are constants with respect to time. The grain boundary mobility parameter K was found to obey an Arrehnius rate law with an apparent activation energy of 1.6 eV, and n was found to increase gradually from 5.2 at 300°C to 8.7 at 700°C. Abnormal grain growth occurred at 500°C or higher, and grain coalescence was identified as an important operative mechanism. It was also observed that the initially as-deposited state of the films was crystalline with a disordered face-centered-cubic structure, but ordering into the equilibrium Ll2 intermetallic structure followed from annealing at temperatures above approximately 500°C.
Persistent Identifierhttp://hdl.handle.net/10722/43045
ISSN
2015 Impact Factor: 1.579
2015 SCImago Journal Rankings: 0.664
ISI Accession Number ID
References

 

DC FieldValueLanguage
dc.contributor.authorNg, HPen_HK
dc.contributor.authorNgan, AHWen_HK
dc.date.accessioned2007-03-23T04:37:33Z-
dc.date.available2007-03-23T04:37:33Z-
dc.date.issued2002en_HK
dc.identifier.citationJournal Of Materials Research, 2002, v. 17 n. 8, p. 2085-2094en_HK
dc.identifier.issn0884-2914en_HK
dc.identifier.urihttp://hdl.handle.net/10722/43045-
dc.description.abstractThe grain growth kinetics and ordering behavior of direct-current magnetron sputter-deposited Ni75at.%Al25at.% alloy films were investigated using in situ isothermal annealing in a transmission electron microscope. Both normal and abnormal grain growth modes were observed. The normal grain growth kinetics under isothermal heating from 300 to 700°C were found to comply with the Burke law d = K/dn-1, where d is grain size and K and n are constants with respect to time. The grain boundary mobility parameter K was found to obey an Arrehnius rate law with an apparent activation energy of 1.6 eV, and n was found to increase gradually from 5.2 at 300°C to 8.7 at 700°C. Abnormal grain growth occurred at 500°C or higher, and grain coalescence was identified as an important operative mechanism. It was also observed that the initially as-deposited state of the films was crystalline with a disordered face-centered-cubic structure, but ordering into the equilibrium Ll2 intermetallic structure followed from annealing at temperatures above approximately 500°C.en_HK
dc.format.extent393396 bytes-
dc.format.extent40924 bytes-
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dc.format.mimetypeapplication/pdf-
dc.format.mimetypeapplication/pdf-
dc.format.mimetypetext/plain-
dc.languageengen_HK
dc.publisherMaterials Research Society. The Journal's web site is located at http://www.mrs.org/publications/jmren_HK
dc.relation.ispartofJournal of Materials Researchen_HK
dc.rightsJournal of Materials Research. Copyright © Materials Research Society.en_HK
dc.rightsCreative Commons: Attribution 3.0 Hong Kong License-
dc.subjectEngineeringen_HK
dc.subjectEngineering mechanics and materials physicsen_HK
dc.titleAn in situ transmission electron microscope investigation into grain growth and ordering of sputter-deposited nanocrystalline Ni3Al thin filmsen_HK
dc.typeArticleen_HK
dc.identifier.openurlhttp://library.hku.hk:4550/resserv?sid=HKU:IR&issn=0884-2914&volume=17&issue=8&spage=2085&epage=2094&date=2002&atitle=An+in+situ+transmission+electron+microscope+investigation+into+grain+growth+and+ordering+of+sputter-deposited+nanocrystalline+Ni3Al+thin+filmsen_HK
dc.identifier.emailNgan, AHW:hwngan@hkucc.hku.hken_HK
dc.identifier.authorityNgan, AHW=rp00225en_HK
dc.description.naturepublished_or_final_versionen_HK
dc.identifier.doi10.1557/JMR.2002.0308en_HK
dc.identifier.scopuseid_2-s2.0-0036672492en_HK
dc.identifier.hkuros76775-
dc.relation.referenceshttp://www.scopus.com/mlt/select.url?eid=2-s2.0-0036672492&selection=ref&src=s&origin=recordpageen_HK
dc.identifier.volume17en_HK
dc.identifier.issue8en_HK
dc.identifier.spage2085en_HK
dc.identifier.epage2094en_HK
dc.identifier.isiWOS:000177208800033-
dc.publisher.placeUnited Statesen_HK
dc.identifier.scopusauthoridNg, HP=7401619209en_HK
dc.identifier.scopusauthoridNgan, AHW=7006827202en_HK

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