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Article: Direct patterning of membrane-derivatized colloids using in-situ UV-ozone photolithography

TitleDirect patterning of membrane-derivatized colloids using in-situ UV-ozone photolithography
Authors
Issue Date2005
Citation
Advanced Materials, 2005, v. 17, n. 12, p. 1477-1480 How to Cite?
AbstractA method for direct patterning of lipid bilayer membranes on the surface of colloidal-silica particles by in-site UV photochemical lithography was analyzed. Highly parallel generation of micrometer-resolution membrane patterns was achieved with biocompatible processes. The direct patterning technique enabled the presentation of biomolecules in a controllably asymmetric manner. The results show that the homogeneity of membrane patterns over the surface of the colloidal particle suggests the achievement of 3D photolithography.
Persistent Identifierhttp://hdl.handle.net/10722/202190
ISSN
2015 Impact Factor: 18.96
2015 SCImago Journal Rankings: 9.021
ISI Accession Number ID

 

DC FieldValueLanguage
dc.contributor.authorYu, Chenghan-
dc.contributor.authorParikh, Atul N.-
dc.contributor.authorGroves, Jay T.-
dc.date.accessioned2014-08-22T02:57:47Z-
dc.date.available2014-08-22T02:57:47Z-
dc.date.issued2005-
dc.identifier.citationAdvanced Materials, 2005, v. 17, n. 12, p. 1477-1480-
dc.identifier.issn0935-9648-
dc.identifier.urihttp://hdl.handle.net/10722/202190-
dc.description.abstractA method for direct patterning of lipid bilayer membranes on the surface of colloidal-silica particles by in-site UV photochemical lithography was analyzed. Highly parallel generation of micrometer-resolution membrane patterns was achieved with biocompatible processes. The direct patterning technique enabled the presentation of biomolecules in a controllably asymmetric manner. The results show that the homogeneity of membrane patterns over the surface of the colloidal particle suggests the achievement of 3D photolithography.-
dc.languageeng-
dc.relation.ispartofAdvanced Materials-
dc.titleDirect patterning of membrane-derivatized colloids using in-situ UV-ozone photolithography-
dc.typeArticle-
dc.description.naturelink_to_subscribed_fulltext-
dc.identifier.doi10.1002/adma.200401586-
dc.identifier.scopuseid_2-s2.0-20644472646-
dc.identifier.volume17-
dc.identifier.issue12-
dc.identifier.spage1477-
dc.identifier.epage1480-
dc.identifier.isiWOS:000229891300004-

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