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  Patent History
  • Application
    US 11/089197 2005-03-24
  • Publication
    US 20050215783 2005-09-29
  • Granted
    US 7501510 2009-03-10
Supplementary

granted patent: Thiourea Compositions And Uses Thereof

TitleThiourea Compositions And Uses Thereof
Granted PatentUS 7501510
Granted Date2009-03-10
Priority Date2005-03-24 US 11/089197
2004-03-26 US 11/556570P
Inventors
Issue Date2009
Citation
US Patent 7501510. Washington, DC: US Patent and Trademark Office (USPTO), 2009 How to Cite?
AbstractThe Invention Provides N,N'-Disubstituted Monothiourea Or Bis-Thiourea-Pd(0) Complexes That Are Useful As Catalysts For Palladium-Catalyzed Heck Reaction Of Aryl Iodides And Bromides With Olefins, And As Catalysts For Palladium Catalyzed Suzuki Reactions Of Organoboric Compounds And Aryl Halides.
Persistent Identifierhttp://hdl.handle.net/10722/142101

 

DC FieldValueLanguage
dc.date.accessioned2011-10-19T06:29:41Z-
dc.date.available2011-10-19T06:29:41Z-
dc.date.issued2009-
dc.identifier.citationUS Patent 7501510. Washington, DC: US Patent and Trademark Office (USPTO), 2009en_HK
dc.identifier.urihttp://hdl.handle.net/10722/142101-
dc.description.abstractThe Invention Provides N,N'-Disubstituted Monothiourea Or Bis-Thiourea-Pd(0) Complexes That Are Useful As Catalysts For Palladium-Catalyzed Heck Reaction Of Aryl Iodides And Bromides With Olefins, And As Catalysts For Palladium Catalyzed Suzuki Reactions Of Organoboric Compounds And Aryl Halides.en_HK
dc.relation.isreferencedbyWO 2011018790 (A1) 2011-02-17en_HK
dc.titleThiourea Compositions And Uses Thereofen_HK
dc.typePatenten_US
dc.identifier.emailYang, Dan:yangdan@hku.hken_US
dc.identifier.authorityYang, Dan=rp00825en_US
dc.description.naturepublished_or_final_version-
dc.contributor.inventorYang, Danen_US
dc.contributor.inventorChen, Ying-chunen_US
patents.identifier.applicationUS 11/089197en_HK
patents.identifier.grantedUS 7501510en_HK
patents.description.assigneeUniv Hong Kong [Cn]en_HK
patents.description.countryUnited States of Americaen_HK
patents.date.publication2005-09-29en_HK
patents.date.granted2009-03-10en_HK
patents.identifier.hkutechidChm-2004-00157-1en_US
patents.date.application2005-03-24en_HK
patents.date.priority2005-03-24 US 11/089197en_HK
patents.date.priority2004-03-26 US 11/556570Pen_HK
patents.description.ccUSen_HK
patents.identifier.publicationUS 20050215783en_HK
patents.relation.familyCN 1938280 (A) 2007-03-28en_HK
patents.relation.familyEP 1730117 (A2) 2006-12-13en_HK
patents.relation.familyJP 2007530461 (A) 2007-11-01en_HK
patents.relation.familyUS 2005215783 (A1) 2005-09-29en_HK
patents.relation.familyUS 7501510 (B2) 2009-03-10en_HK
patents.relation.familyWO 2005091697 (A2) 2005-10-06en_HK
patents.description.kindB2en_HK
patents.typePatent_granteden_HK

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