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Characterization of linewidth variation on 248- and 193-nm exposure toolsGabor, A; Brunner, T; Chen, J; Chen, N; Deshpande, S; Ferguson, R; Horak, DV; Holmes, S; Liebmann, L; Mansfield, S; Molless, A; Progler, CJ; Rabidoux, R; Ryan, D; Talvi, P; Tsou, L; Vampatella, B; Wong, AKK; Yang, Q; Yu, CF2001729
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