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Conference Paper: Inverse synthesis of phase-shifting mask for optical lithography

TitleInverse synthesis of phase-shifting mask for optical lithography
Authors
Issue Date2007
Persistent Identifierhttp://hdl.handle.net/10722/99716

 

DC FieldValueLanguage
dc.contributor.authorChan, SHen_HK
dc.contributor.authorWong, Aen_HK
dc.contributor.authorLam, EYMen_HK
dc.date.accessioned2010-09-25T18:41:27Z-
dc.date.available2010-09-25T18:41:27Z-
dc.date.issued2007en_HK
dc.identifier.urihttp://hdl.handle.net/10722/99716-
dc.languageengen_HK
dc.relation.ispartofOSA Topical Meeting in Signal Recovery and Synthesisen_HK
dc.titleInverse synthesis of phase-shifting mask for optical lithographyen_HK
dc.typeConference_Paperen_HK
dc.identifier.emailLam, EYM: elam@eee.hku.hken_HK
dc.identifier.authorityLam, EYM=rp00131en_HK
dc.identifier.hkuros128189en_HK

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